Lithographic apparatus and device manufacturing method

• US 7,756,660 B2
• Filed: 12/28/2004
• Issued: 07/13/2010
• Est. Priority Date: 12/28/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Hoogenraad, Johannes Herman
• Primary Examiner(s): Nghiem; Michael P
• Application Number:
  US11/022,921
• Publication Number:
  US 20060139601A1
• Time in Patent Office: 2,023 Days
• Field of Search: 702/94, 702/95, 702150-153, 702/158, 702/159, 702/170, 702/172
• US Class Current: 702/94
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

A lithographic apparatus has an array of individually controllable elements to impart a projection beam with a pattern in its cross-section. The projection system includes an array of lenses and an actuator configured to change the shape of the array of lenses. In one example, the actuator is a piezoelectric actuator

Claims

1. A lithographic apparatus comprising:

an array of individually controllable elements configured to provide a patterned radiation beam; and

a projection system that projects the patterned radiation beam onto a target portion of a substrate, the projection system comprising;

an array of lenses arranged in a plane, such that each lens in the array of lenses transmits a different part of the patterned beam, and

an actuator system that changes a location of at least one lens with respect to other lenses such that the array of lenses is at least partially deformed from an original position such that the at least partial deformation is in a direction perpendicular to the plane of the array of lenses.

2. The apparatus of claim 1, wherein the actuator system comprises a plurality of actuators.

3. The apparatus of claim 1, wherein the actuator system comprises at least one piezoelectric actuator.

4. The apparatus of claim 1, further comprising:

a substrate surface location detector wherein the actuator system is configured to adjust the shape of the array of lenses based on the location of a detected substrate surface.

5. The apparatus of claim 1, wherein the array of individually controllable elements comprises an emitting portion configured to emit the patterned radiation beam.