Dual top gas feed through distributor for high density plasma chamber

• US 7,758,698 B2
• Filed: 11/28/2006
• Issued: 07/20/2010
• Est. Priority Date: 11/28/2006
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Pham, Phong, Nemani, Srivivas D., Yieh, Ellie Y., Bang, Won B.
• Primary Examiner(s): Zervigon; Rudy
• Application Number:
  US11/564,122
• Publication Number:
  US 20080121178A1
• Time in Patent Office: 1,330 Days
• Field of Search: 118/715, 156/345.33, 156/345.34
• US Class Current: 118/715
• CPC Class Codes: C23C 16/4405 Cleaning of reactor or parts inside the reactor by using reactive gases
• CPC Class Codes: C23C 16/45574 Nozzles for more than one gas
• CPC Class Codes: C23C 16/45591 Fixed means, e.g. wings, baffles
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow

Abstract

A gas distributor for use in a semiconductor process chamber comprises a body. The body includes a first channel formed within the body and adapted to pass a first fluid from a first fluid supply line through the first channel to a first opening. A second channel is formed within the body and adapted to pass a second fluid from a second fluid supply line through the second channel to a second opening. The first and second openings are arranged to mix the fluids outside the body after the fluids pass through the openings.

Claims

1. A gas distributor for use in a semiconductor process chamber comprising a support, the gas distributor comprising:

a body including;

a neck having a first diameter,

an upper end adjacent to the neck,

a first channel extending from a first inlet disposed on the upper end to at least a first opening disposed on a lower surface of the body, the first channel adapted to pass a first fluid from a first fluid supply line in the support to at least the first opening,

a second channel extending from a second inlet disposed on the upper end to at least a second opening disposed on the lower surface of the body, the second channel adapted to pass a second fluid from a second fluid supply line in the support to at least the second opening, wherein the body is generally rotationally symmetric about an axis extending along the body from the neck to a center of the lower surface of the body,

a connector coupled to the neck and adapted to engage the support and hold the body in a predetermined rotational orientation about the axis such that the first channel is substantially aligned with the first fluid supply line and the second channel is substantially aligned with the second fluid supply line,

a lateral seat extending outward from the neck,

a concave surface extending from an outer periphery of the lateral seat outward and toward the lower surface of the body, and

a baffle disposed between the concave surface and the lower surface of the body, wherein the lower surface of the body includes a central flat portion and a recessed peripheral flat portion separated from the central flat portion by a step, the first opening disposed on the step and the second opening disposed on the central flat portion, and wherein the central flat portion extends radially from the center of the lower surface of the body to the step and has a second diameter greater than the first diameter.

2. The gas distributor of claim 1 wherein the connector is adapted to connect the gas distributor to the support and seal the first channel to the first fluid supply line and the second channel to the second fluid supply line with no more than a half turn of the gas distributor relative to the support.

3. The gas distributor of claim 2 wherein the connector comprises structures adapted to engage the support and limit rotation of the gas distributor at the predetermined orientation.

4. The gas distributor of claim 2 wherein the connector is adapted to connect the gas distributor to the support and seal the first channel to the first fluid supply line and the second channel to the second fluid supply line with about a quarter turn of the gas distributor relative to the support.

5. The gas distributor of claim 1 wherein the connector comprises a first flange and a second flange and wherein the flanges are adapted to support the gas distributor.

6. The gas distributor of claim 5 wherein the support comprises a channel adapted to receive the first flange while the connector and the support are in a first orientation to insert the connector into the support, and wherein the flanges engage the support while the connector and the support are in the predetermined orientation.

7. The gas distributor of claim 6 wherein the flanges are adapted to engage the support with a quarter turn of the gas distributor from the first orientation to the predetermined orientation.

8. The gas distributor of claim 1 wherein the body is formed from a single piece of material.