Methods for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
First Claim
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1. A method of fabricating optical microstructures comprising:
- rotating a cylindrical platform that includes a radiation sensitive layer thereon about an axis thereof;
whilesimultaneously axially rastering a radiation beam across a portion of the radiation sensitive layer; and
whilesimultaneously continuously translating the cylindrical platform and/or radiation beam axially relative to one another,wherein simultaneously axially rastering comprises;
simultaneously axially rastering a radiation beam along first and second opposite axial directions across a portion of the radiation sensitive layer to image the optical microstructures in the radiation sensitive layer along the first axial direction and to blank the radiation beam along the second axial direction.
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Abstract
Optical microstructures, such as microlenses, are fabricated by rotating a cylindrical platform that includes a radiation sensitive layer thereon, about its axis, while simultaneously axially rastering a laser beam across at least a portion of the radiation sensitive layer. The cylindrical platform is also simultaneously translated axially while it is being rotated. The amplitude of the laser beam is continuously varied while rastering. The optical microstructures that are imaged in the radiation sensitive layer can be developed to provide a master for replicating a microlenses.
37 Citations
33 Claims
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1. A method of fabricating optical microstructures comprising:
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rotating a cylindrical platform that includes a radiation sensitive layer thereon about an axis thereof;
whilesimultaneously axially rastering a radiation beam across a portion of the radiation sensitive layer; and
whilesimultaneously continuously translating the cylindrical platform and/or radiation beam axially relative to one another, wherein simultaneously axially rastering comprises; simultaneously axially rastering a radiation beam along first and second opposite axial directions across a portion of the radiation sensitive layer to image the optical microstructures in the radiation sensitive layer along the first axial direction and to blank the radiation beam along the second axial direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 15, 18, 20, 21, 22, 23, 24)
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10. A method of fabricating optical microstructures comprising:
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rotating a cylindrical platform that includes a radiation sensitive layer thereon about an axis thereof;
whilesimultaneously axially rastering a radiation beam across a portion of the radiation sensitive layer; and
whilesimultaneously continuously translating the cylindrical platform and/or radiation beam axially relative to one another; wherein the cylindrical platform is at least about one foot in circumference and/or at least about one foot in axial length; and wherein rotating is performed at angular velocity of at least about 1 revolution per minute. - View Dependent Claims (11)
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12. A method of fabricating optical microstructures comprising:
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rotating a cylindrical platform that includes a radiation sensitive layer thereon about an axis thereof;
whilesimultaneously axially rastering a radiation beam across a portion of the radiation sensitive layer; and
whilesimultaneously continuously translating the cylindrical platform and/or radiation beam axially relative to one another; wherein rotating and simultaneously axially rastering are performed continuously for at least about 1 hour. - View Dependent Claims (13)
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14. A method of fabricating optical microstructures comprising:
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rotating a cylindrical platform that includes a radiation sensitive layer thereon about an axis thereof;
whilesimultaneously axially rastering a radiation beam across a portion of the radiation sensitive layer; and
whilesimultaneously continuously translating the cylindrical platform and/or radiation beam axially relative to one another; wherein the optical microstructures comprise microlenses.
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16. A method of fabricating optical microstructures comprising:
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rotating a cylindrical platform that includes a radiation sensitive layer thereon about an axis thereof;
whilesimultaneously axially rastering a radiation beam across a portion of the radiation sensitive layer; and
whilesimultaneously continuously translating the cylindrical platform and/or radiation beam axially relative to one another; wherein the cylindrical platform also includes a substrate on the radiation sensitive layer that is transparent to the radiation beam and wherein simultaneously axially rastering comprises simultaneously axially rastering a radiation beam through the substrate that is transparent thereto across a portion of the radiation sensitive layer. - View Dependent Claims (17, 19)
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25. A method of fabricating optical microstructures comprising:
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rotating a cylindrical platform that includes a radiation sensitive layer thereon about an axis thereof;
whilesimultaneously axially rastering a laser beam across a portion of the radiation sensitive layer while continuously varying amplitude of the laser beam; and
whilesimultaneously translating the cylindrical platform and/or laser beam axially relative to one another; wherein simultaneously axially rastering is performed at sufficient speed, relative to rotating, such that the laser beam images an optical microstructure over a plurality of scans of the laser beam. - View Dependent Claims (26, 27, 28, 29, 30, 31)
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32. A method of fabricating optical microstructures comprising:
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rotating a cylindrical platform that includes a radiation sensitive layer thereon about an axis thereof;
whilesimultaneously axially rastering a laser beam across a portion of the radiation sensitive layer while continuously varying amplitude of the laser beam; and
whilesimultaneously translating the cylindrical platform and/or laser beam axially relative to one another; wherein the radiation sensitive layer is a negative photoresist layer such that portions of the negative photoresist layer that are exposed to the radiation beam remain after development; and wherein the cylindrical platform also includes a substrate on the negative photoresist layer that is transparent to the laser beam and wherein simultaneously axially rastering comprises simultaneously axially rastering a laser beam through the substrate that is transparent thereto across a portion of the negative photoresist layer. - View Dependent Claims (33)
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Specification