Semiconductor device and manufacturing method thereof
First Claim
1. A method for manufacturing a semiconductor device, the method comprising:
- forming a pair of adjacent gate structures on a substrate;
forming mask patterns exposing a portion of the substrate located between the gate structures;
etching the portion of the substrate located between the gate structures using the mask patterns as an etch mask to form a pocket;
implanting first conduction type impurities into the pocket to form a first conduction type impurity layer in a surface of the pocket;
implanting second conduction type impurities into the pocket to form a second conduction type impurity layer on the first conduction type impurity layer; and
filling the pocket with an insulating material.
1 Assignment
0 Petitions
Accused Products
Abstract
Provided are a semiconductor device and a manufacturing method thereof. A pair of adjacent gate structure can be formed on a substrate. Mask patterns exposing a portion located between the gate structures are formed. The substrate portion located between the gate structures can be etched using the mask patterns as an etch mask to form a pocket. First conduction type impurities can be implanted into the pocket to form a first impurity layer in a surface of the pocket. Second conduction type impurities can be implanted into the pocket to form a second impurity layer on the first impurity layer. The pocket can be filled with an insulating material. Accordingly, impurities having a type opposite to the type of source junction impurities are implanted into the pocket to reduce a potential barrier of a source junction. Consequently, punch-through generated between a source and a drain can be inhibited.
6 Citations
9 Claims
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1. A method for manufacturing a semiconductor device, the method comprising:
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forming a pair of adjacent gate structures on a substrate; forming mask patterns exposing a portion of the substrate located between the gate structures; etching the portion of the substrate located between the gate structures using the mask patterns as an etch mask to form a pocket; implanting first conduction type impurities into the pocket to form a first conduction type impurity layer in a surface of the pocket; implanting second conduction type impurities into the pocket to form a second conduction type impurity layer on the first conduction type impurity layer; and filling the pocket with an insulating material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification