Dual-suspension system for MEMS-based devices and method for fabricating same

• US 7,767,483 B1
• Filed: 07/19/2007
• Issued: 08/03/2010
• Est. Priority Date: 07/25/2006
• Status: Active Grant

• Current Assignee: the united states of america as represented by the secretary of the navy
• Original Assignee: the united states of america as represented by the secretary of the navy
• Inventors: Waters, Richard L.
• Primary Examiner(s): Smith; Bradley K
• Assistant Examiner(s): Movva; Amar
• Application Number:
  US11/780,420
• Time in Patent Office: 1,111 Days
• Field of Search: 438/51, 438/50, 438/52, 438/53, 257/E29.234
• US Class Current: 438/51
• CPC Class Codes: B81C 1/00182 Arrangements of deformable or non-deformable structures, e.g. membrane and cavity for use in a transducer
• CPC Class Codes: G01P 15/0802 Details

Abstract

A method for fabricating a dual-suspension system for MEMS-based devices includes: etching the geometry of an upper spring system, a lower spring system, and a proof mass into a substrate; applying a protective barrier to cover at least the exposed portions of the first layer of silicon; etching through portions of the protective barrier and handle wafer to define the shapes of the upper spring system, lower spring system, and proof mass; removing the remainder of the protective barrier; and removing the first layer of oxide from the areas in contact with the upper spring system and removing the second layer of oxide from the areas in contact with the lower spring system. Electrical contacts may be created on the substrate. A wafer may be bonded to the support structure on a side of the substrate. A MEMS-based device fabricated from the method is also provided.

Claims

1. A method for fabricating a dual-suspension system for MEMS-based devices comprising the steps of:

etching the geometry of an upper spring system, a lower spring system, and a proof mass into a substrate, the substrate initially comprising;

a handle wafer having a first side and a second side,

a first layer of oxide covering the first side and a second layer of oxide covering the second side, and

a first layer of silicon covering the first layer of oxide and a second layer of silicon covering the second layer of oxide, wherein the geometry of the upper spring system, the lower spring system, and the proof mass are etched into each of the first layer of silicon and the second layer of silicon, the regions of the substrate opposite the proof mass and adjacent to the upper spring system and the lower spring system defining a support structure;

applying a protective barrier to cover at least the exposed portions of the first layer of silicon;

etching through portions of the protective barrier and the handle wafer to define the shapes of the upper spring system, the lower spring system, and the proof mass;

removing the remainder of the protective barrier; and

removing the first layer of oxide from the areas in contact with the upper spring system and removing the second layer of oxide from the areas in contact with the lower spring system.

2. The method for fabricating a dual-suspension system for MEMS-based devices of claim 1, wherein the etching may be performed by dry etching techniques.

3. The method for fabricating a dual-suspension system for MEMS-based devices of claim 1, wherein the handle wafer is substantially comprised of crystalline silicon.

4. The method for fabricating a dual-suspension system for MEMS-based devices of claim 1, further comprising the step of bonding a wafer to the support structure on at least one side of the substrate.

5. The method for fabricating a dual-suspension system for MEMS-based devices of claim 4, wherein the step of bonding a wafer to the support structure on at least one side of the substrate comprises the steps of:

applying a bonding layer of oxide to at least one portion of one side of the wafer;

creating a trench in at least one portion of the second layer of silicon on the support structure;

filling at least a portion of the trenches with an adhesive material;

aligning the trenches to the portions of the wafer having a bonding layer of oxide; and

pressing the wafer to the substrate, wherein at least one bonding region is formed from the contacting of the trenches with the portions of the wafer having a bonding layer of oxide.

6. The method for fabricating a dual-suspension system for MEMS-based devices of claim 4 further comprising the steps of:

creating a first optical device on the surface of the substrate adjacent to the wafer;

creating a second optical device on the surface of the wafer adjacent to the substrate; and

aligning the first optical device with the second optical device such that light passing through the first optical device may contact the second optical device.

7. The method for fabricating a dual-suspension system for MEMS-based devices of claim 6, wherein the first optical device is a mirror and the second optical device is a photo detector.

8. The method for fabricating a dual-suspension system for MEMS-based devices of claim 6 further comprising the step of bonding a cap wafer to the support structure of the other side of the substrate.

9. The method for fabricating a dual-suspension system for MEMS-based devices of claim 8, wherein the cap wafer includes an optical light source coupled thereto, wherein the optical light source is aligned with the first optical device such that light may pass from the optical light source through the first optical device to the second optical device.

10. The method for fabricating a dual-suspension system for MEMS-based devices of claim 9, wherein the cap wafer is comprised of an optically transparent material such that light may pass from the optical light source through the cap wafer and through the first optical device to the second optical device.

11. The method for fabricating a dual-suspension system for MEMS-based devices of claim 9, wherein the cap wafer contains a cavity therethrough, wherein light may pass from the optical light source through the cavity and through the first optical device to the second optical device.

12. The method for fabricating a dual-suspension system for MEMS-based devices of claim 9, wherein the optical light source is a semi-conducting laser.

13. The method for fabricating a dual-suspension system for MEMS-based devices of claim 1, further comprising the step of creating one or more electrical contacts on at least one surface of the substrate.

14. The method for fabricating a dual-suspension system for MEMS-based devices of claim 13, wherein the step of creating one or more electrical contacts on at least one surface of the substrate comprises the steps of:

creating a first electrical contact by etching through the first layer of silicon and the first layer of oxide, depositing a layer of polysilicon over at least a portion of the region of the handle wafer exposed by the etching, the layer of polysilicon overlapping a portion of the first layer of silicon, and metallizing the polysilicon to allow for wire bonding to a package; and

creating a second electrical contact by etching through the second layer of silicon and the second layer of oxide, depositing a layer of polysilicon over at least a portion of the region of the handle wafer exposed by the etching, the layer of polysilicon overlapping a portion of the first layer of silicon, and metallizing the polysilicon to allow for wire bonding to a package, wherein the first electrical contact, the second electrical contact, and the handle wafer allow for electrical potential to be applied to the substrate.

15. The method for fabricating a dual-suspension system for MEMS-based devices of claim 1, wherein the protective barrier is comprised of a deposited oxide.

16. The method for fabricating a dual-suspension system for MEMS-based devices of claim 1, wherein the step of etching through portions of the protective barrier and the handle wafer to define the shapes of the upper spring system, the lower spring system, and the proof mass comprises the steps of:

etching through the areas between the upper spring system and proof mass;

etching through the areas between each spring of the upper spring system; and

etching through the areas between the upper spring system and the support structure.

17. The method for fabricating a dual-suspension system for MEMS-based devices of claim 16, wherein the step of etching through portions of the protective barrier and the handle wafer to define the shapes of the upper spring system, the lower spring system, and the proof mass further comprises the step of etching through the areas beneath each spring of the upper spring system and above each spring of the lower spring system.

18. The method for fabricating a dual-suspension system for MEMS-based devices of claim 1, wherein the steps of removing the remainder of the protective barrier and removing the first layer of oxide from the areas in contact with the upper spring system and removing the second layer of oxide from the areas in contact with the lower spring system are performed by use of a wet oxide etchant.

19. The method for fabricating a dual-suspension system for MEMS-based devices of claim 1, wherein the first layer of silicon and the second layer of silicon are comprised of crystalline silicon.

20. A method for fabricating a dual-suspension system for MEMS-based devices comprising the steps of:

etching the geometry of an upper spring system, a lower spring system, and a proof mass into a substrate, the substrate initially comprising;

a handle wafer having a first side and a second side,

a first layer of oxide covering the first side and a second layer of oxide covering the second side, and

a first layer of silicon covering the first layer of oxide and a second layer of silicon covering the second layer of oxide, wherein the geometry of the upper spring system, the lower spring system, and the proof mass are etched into each of the first layer of silicon and the second layer of silicon, the regions of the substrate opposite the proof mass and adjacent to the upper spring system and the lower spring system defining a support structure;

applying a protective barrier to cover at least the exposed portions of the first layer of silicon;

bonding a wafer to the support structure on at least one side of the substrate;

etching through portions of the protective barrier and the handle wafer to define the shapes of the upper spring system, the lower spring system, and the proof mass;

removing the remainder of the protective barrier;

removing the first layer of oxide from the areas in contact with the upper spring system and removing the second layer of oxide from the areas in contact with the lower spring system; and

creating one or more electrical contacts on at least one surface of the substrate.

21. The method for fabricating a dual-suspension system for MEMS-based devices of claim 20, wherein the step of bonding a wafer to the support structure on at least one side of the substrate comprises the steps of:

applying a bonding layer of oxide to at least one portion of one side of the wafer;

creating a trench in at least one portion of the second layer of oxide of the support structure;

filling at least a portion of the trench with an adhesive material;

aligning the portions of the wafer having the bonding layer of oxide to the trenches; and

pressing the wafer to the substrate, wherein at least one bonding region is formed from the contacting of the trenches with the portions of the wafer having the bonding layer of oxide.

22. The method for fabricating a dual-suspension system for MEMS-based devices of claim 21, wherein the adhesive material is glass frit.

23. The method for fabricating a dual-suspension system for MEMS-based devices of claim 20, wherein the step of bonding a wafer to the support structure on at least one side of the substrate is performed by fusion bonding.

24. The method for fabricating a dual-suspension system for MEMS-based devices of claim 20 further comprising the step of bonding a cap wafer to the support structure on the other side of the substrate.

25. The method for fabricating a dual-suspension system for MEMS-based devices of claim 24 further comprising the steps of:

creating a first optical device on the surface of the substrate adjacent to the wafer;

creating a second optical device on the surface of the wafer adjacent to the substrate; and

aligning the first optical device with the second optical device such that light passing through the first optical device may contact the second optical device.

26. The method for fabricating a dual-suspension system for MEMS-based devices of claim 25, wherein the first optical device is a mirror and the second optical device is a mirror.

27. The method for fabricating a dual-suspension system for MEMS-based devices of claim 25, wherein the cap wafer includes an optical light source, wherein the optical light source is aligned with the first optical device such that light may pass from the optical light source through the first optical device to the second optical device.

28. The method for fabricating a dual-suspension system for MEMS-based devices of claim 20, wherein the step of creating one or more electrical contacts on at least one surface of the substrate comprises the steps of:

creating a first electrical contact by etching through the first layer of silicon and the first layer of oxide and depositing a layer of metal over at least a portion of the region of the handle wafer exposed by the etching; and

creating a second electrical contact by etching through the second layer of silicon and the second layer of oxide and depositing a layer of metal over at least a portion of the region of the handle wafer exposed by the etching, wherein the first electrical contact, the second electrical contact, and the handle wafer allow for electrical potential to be applied to the substrate.

29. A method for fabricating a dual-suspension system for MEMS-based devices comprising the steps of:

etching the geometry of an upper spring system, a lower spring system, and a proof mass into a substrate, the substrate initially comprising;

a handle wafer having a first side and a second side,

a first layer of oxide covering the first side and a second layer of oxide covering the second side, and

a first layer of silicon covering the first layer of oxide and a second layer of silicon covering the second layer of oxide, wherein the geometry of the upper spring system, the lower spring system, and the proof mass are etched into each of the first layer of silicon and the second layer of silicon, the regions of the substrate opposite the proof mass and adjacent to the upper spring system and the lower spring system defining a support structure;

applying a protective barrier to cover at least the exposed portions of the first layer of silicon;

bonding a wafer to the support structure on at least one side of the substrate by the steps of;

applying a bonding layer of oxide to at least one portion of one side of the wafer;

creating a trench in at least one portion of the second layer of silicon on the support structure;

filling at least a portion of the trench with an adhesive material,

aligning the portions of the wafer having the bonding layer of oxide to the trenches, and

pressing the wafer to the substrate, wherein at least one bonding region is formed from the contacting of the trenches with the portions of the wafer having the bonding layer of oxide;

etching through portions of the protective barrier and the handle wafer to define the shapes of the upper spring system, the lower spring system, and the proof mass;

removing the remainder of the protective barrier;

removing the first layer of oxide from the areas in contact with the upper spring system and removing the second layer of oxide from the areas in contact with the lower spring system; and

creating one or more electrical contacts on at least one surface of the substrate.

30. The method for fabricating a dual-suspension system for MEMS-based devices of claim 29, wherein the step of creating one or more electrical contacts on at least one surface of the substrate comprises the steps of:

creating a first electrical contact by etching through the first layer of silicon and the first layer of oxide, depositing a layer of polysilicon over at least a portion of the region of the handle wafer exposed by the etching, the layer of polysilicon overlapping a portion of the first layer of silicon, and metallizing the polysilicon to allow for wire bonding to a package; and

creating a second electrical contact by etching through the second layer of silicon and the second layer of oxide, depositing a layer of polysilicon over at least a portion of the region of the handle wafer exposed by the etching, the layer of polysilicon overlapping a portion of the first layer of silicon, and metallizing the polysilicon to allow for wire bonding to a package, wherein the first electrical contact, the second electrical contact, and the handle wafer allow for electrical potential to be applied to the substrate.

31. The method for fabricating a dual-suspension system for MEMS-based devices of claim 29 further comprising the steps of:

creating a first optical device within the substrate;

creating a second optical device within the surface of the wafer adjacent to the substrate; and

aligning the first optical device with the second optical device such that light passing through the first optical device may contact the second optical device.

32. The method for fabricating a dual-suspension system for MEMS-based devices of claim 31 further comprising the step of bonding a cap wafer to the support structure of the other side of the substrate, the cap wafer having an optical light source coupled thereto, wherein the optical light source is aligned with the first optical device such that light may pass from the optical light source through the first optical device to the second optical device.