Organometallic compounds
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Abstract
Organometallic compounds suitable for use as vapor phase deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-containing films using certain organometallic precursors are also provided. Such Group IV metal-containing films are particularly useful in the manufacture of electronic devices.
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5 Claims
- 1. A compound of formula IIA or IIB:
Specification