MEMS device package and method for manufacturing the same

• US 7,772,026 B2
• Filed: 11/10/2005
• Issued: 08/10/2010
• Est. Priority Date: 12/27/2004
• Status: Active Grant

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: Kim, Jong-seok, Song, In-sang, Park, Yun-kwon, Nam, Kuang-woo, Yun, Seok-chul
• Primary Examiner(s): Lindsay, Jr.; Walter L.
• Assistant Examiner(s): POMPEY, RON EVERETT
• Application Number:
  US11/270,482
• Publication Number:
  US 20060141650A1
• Time in Patent Office: 1,734 Days
• Field of Search: 438/51, 438/52, 438/112, 438/123, 438/456, 438/459, 438/709, 438/725, 257/E21.513, 257/E21.515
• US Class Current: 438/51
• CPC Class Codes: B81C 1/00269 Bonding of solid lids or wafers to the substrate
• CPC Class Codes: H01L 2924/16235 Connecting to a semiconductor or solid-state bodies, i.e. cap-to-chip

Abstract

A micro electro-mechanical system (MEMS) device package and a method of manufacturing the same are provided. The inventive MEMS device package includes: a device substrate with a MEMS active device being formed on the top surface thereof; internal electrode pads, each of which is positioned on the opposite side of the MEMS active device to provide a space where the MEMS active device is positioned and an electrical path for the MEMS active device, each of the internal electrode pads, and comprises first and second pads arranged opposite to one another with a clearance therebetween; sealing pads positioned outside of the internal electrode pads; a closure substrate joined to the device substrate through the sealing pads, the closure substrate having via holes formed at the areas where the internal electrode pads are positioned; connection members each formed on the inner surfaces of the via holes to be in contact with the internal electrode pads at one ends thereof; and external electrode pads formed on the top surface of the closure substrate in such a way that the external electrode pads are in contact with the other ends of the connection members.

Claims

1. A method of manufacturing a micro electro-mechanical system (MEMS) device package, the method comprising:

a) forming several via holes having a predetermined depth on a closure substrate;

b) forming a seed layer on the entire surface of the closure substrate formed with the via holes, the seed layer being formed in a predetermined thickness on inner walls of the via holes without completely filling in the via holes;

c) forming internal electrode pads and sealing pads on the seed layer;

d) bonding the closure substrate, which is formed with the internal electrode pads and the sealing pads, and a device substrate, which is formed with a MEMS active device on the center of the top surface thereof, to each other through the internal electrode pads and the sealing pads;

e) polishing the closure substrate to a predetermined thickness, so that the via holes and the seed layer parts formed in the predetermined thickness in the via holes are exposed; and

f) forming, on the closure substrate, external electrode pads which are electrically connected with the seed layer parts formed in the via holes,

wherein the bonding the closure substrate and the device substrate to each other through the internal electrode pads and the sealing pads comprises direct bonding using a bonding layer formed on the device substrate, and

wherein the bonding layer openings formed to correspond to clearances of the inner electrode pads formed corresponding to the via holes, so that an upper surface of the device substrate corresponding to the openings is exposed to an exterior.

2. The method of claim 1, wherein the step a) comprises:

a1) coating and patterning a photoresist layer on the top surface of the closure substrate; and

a2) performing Inductively Coupled Plasma (ICP)-etching and removing the photoresist layer.

3. The method of claim 1, wherein, the forming of a seed layer on the entire surface of the closure substrate comprises sputtering a material which is identical to the material forming the internal electrode pads and the sealing pads.

4. The method of claim 3, the material sputtered to form a seed layer is Au.

5. The method of claim 1, wherein the forming of internal electrode pads and sealing pads on the seed layer comprises:

c1) forming a plating frame having parts to form internal electrode pads and sealing pads on the seed layer through a photolithography process;

c2) electrically plating a material to form internal electrode pads and sealing pads over the plating frame; and

c3) removing the plating frame and the seed layer underside of the plating frame.

6. The method of claim 5, wherein the material electrically plated to form internal electrode pads and sealing pads is Au.

7. The method of claim 1, wherein bonding of the device substrate and the closure substrate to each other through the sealing pads employs direct bonding using a material identical to the material which forms the internal electrode pads and the sealing pads.

8. The method of claim 7, wherein the identical material is Au.

9. The method of claim 8, wherein the direct bonding using Au is performed at a temperature of 320±

10°

C. for about 20 minutes.

10. The method of claim 1, wherein the forming of external electrode pads on the closure substrate comprises sputtering a material identical to the material which forms the internal electrode pads and the sealing pads.

11. The method of claim 10, wherein the material sputtered to form external electrode pads is Au.