Methods and systems to compensate for a stitching disturbance of a printed pattern
First Claim
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1. A method of using a patterning device, comprising:
- defining a first region on a surface, the first region being associated with a first element of the patterning device;
defining a second region on the surface, the second region being associated with a second element of the patterning device, wherein the first region and the second region overlap in an overlapping region during a single exposure;
activating the first element to expose the overlapping region; and
deactivating the second element when the first element is active.
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Abstract
A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.
46 Citations
17 Claims
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1. A method of using a patterning device, comprising:
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defining a first region on a surface, the first region being associated with a first element of the patterning device; defining a second region on the surface, the second region being associated with a second element of the patterning device, wherein the first region and the second region overlap in an overlapping region during a single exposure; activating the first element to expose the overlapping region; and deactivating the second element when the first element is active. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. An apparatus, comprising:
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a patterning device; a first controller configured to define a first region on a surface, the first region being associated with a first element of the patterning device and a second region of the surface, the second region being associated with a second element of the patterning device, wherein the first region and the second region overlap in an overlapping region during a single exposure; and a second controller configured to direct the patterning device to expose the overlapping region, such that the first element is active and the second element is inactive when the overlapping region is exposed. - View Dependent Claims (10, 11, 12, 13)
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14. A non-transitory computer-readable medium containing instructions for controlling at least one processor to control a patterning device by a method comprising:
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defining a first region on a surface, the first region being associated with a first element of the patterning device; defining a second region on the surface, the second region being associated with a second element of the patterning device, wherein the first region and the second region overlap in an overlapping region during a single exposure; activating the first element to expose the overlapping region; and deactivating the second element when the first element is active. - View Dependent Claims (15, 16, 17)
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Specification