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Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation

  • US 7,773,287 B2
  • Filed: 04/24/2007
  • Issued: 08/10/2010
  • Est. Priority Date: 06/30/2005
  • Status: Active Grant
First Claim
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1. A spatial light modulator (SLM), comprising:

  • a plurality of mirrors structured to form groups of super-pixels, each super-pixel including two or more mirrors from the plurality of mirrors;

    wherein, for a given super-pixel, individual mirrors of the two or more mirrors of that given super-pixel are configured to be separately actuated to compensate for an imperfection of at least one of the two or more mirrors of that given super-pixel.

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