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Methods of emitter formation in solar cells

  • US 7,776,727 B2
  • Filed: 08/29/2008
  • Issued: 08/17/2010
  • Est. Priority Date: 08/31/2007
  • Status: Expired due to Fees
First Claim
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1. A method of forming a solar cell device, comprising:

  • depositing a dielectric layer on a substrate;

    patterning the dielectric layer to form a mask, thereby forming a pattern of exposed regions of the substrate;

    disposing a first amount of a first dopant within the exposed regions of the substrate;

    disposing a second amount of a second dopant within the exposed regions of the substrate, the dielectric layer, and the substrate below the dielectric layer after disposing the first dopant within the exposed regions, thereby forming a first doped region and a second doped region within the substrate, wherein the first dopant has a higher atomic mass than the second dopant; and

    heating the substrate so that the first dopant diffuses a first depth within the substrate and the second dopant diffuses a second depth within the substrate, wherein the second depth of the second doped region is deeper than the first depth of the first doped region.

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