Methods, systems, and computer program products for printing patterns on photosensitive surfaces
First Claim
1. A lithographic apparatus, comprising:
- an illumination system configured to produce a beam of radiation;
an array of individually programmable elements configured to pattern the beam of radiation;
a projection system configured to project the patterned beam onto first and second overlapping target portions of a substrate, the first and second target portions corresponding to first and second elements of the array of individually programmable elements, anda controller configured to control the array of individually controllable elements such that,during a first exposure period;
the first element produces a pattern on the first target portion and the second element does not produce a pattern; and
during a second exposure period;
the second element produces a pattern on the second target portion and the first element within the pair does not produce a pattern.
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Accused Products
Abstract
A method, system, and computer program product are provided for printing a pattern on a photosensitive surface using a maskless lithography system including a spatial light modulator (SLM). The method, system, and computer program product define two or more exposure areas within a predetermined region of the surface, each area corresponding to selected pixels of the SLM. An overlap region is formed between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, the overlapping edges corresponding to overlapping pairs of the selected pixels from each area. The pixels within each pair are alternately activated such that only one of the pixels within the pair is used to produce the pattern.
46 Citations
20 Claims
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1. A lithographic apparatus, comprising:
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an illumination system configured to produce a beam of radiation; an array of individually programmable elements configured to pattern the beam of radiation; a projection system configured to project the patterned beam onto first and second overlapping target portions of a substrate, the first and second target portions corresponding to first and second elements of the array of individually programmable elements, and a controller configured to control the array of individually controllable elements such that, during a first exposure period; the first element produces a pattern on the first target portion and the second element does not produce a pattern; and during a second exposure period; the second element produces a pattern on the second target portion and the first element within the pair does not produce a pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A computer-readable medium containing instructions for controlling at least one processor by a method comprising:
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defining two or more exposure areas within a predetermined region of a photosensitive surface, each area corresponding to selected pixels of a spatial light modulator; forming an overlapping region between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, each overlapping edge corresponding to at least one overlapping pair of the selected pixels from each area; and alternatingly activating the pixels within the pair such that only one of the pixels within the pair produces a pattern during one exposure and only the other pixel within the pair produces the pattern during an ensuing exposure. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A system, comprising:
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a processor; and a memory in communication with the processor, the memory for storing a plurality of processing instructions for directing the processor to; define two or more exposure areas within a predetermined region of a photosensitive surface, each area corresponding to selected pixels of a spatial light modulator; form an overlapping region between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, each overlapping edge corresponding to at least one overlapping pair of the selected pixels from each area; and alternatingly activate the pixels within the pair such that only one of the pixels within the pair produces a pattern during one exposure and only the other pixel within the pair produces the pattern during an ensuing exposure. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification