Structured material and producing method thereof

• US 7,781,020 B2
• Filed: 07/23/2004
• Issued: 08/24/2010
• Est. Priority Date: 07/23/2003
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Kawashima, Yasuhiro, Nakamura, Shinichi, Ogawa, Miki, Miyata, Hirokatsu, Kuriyama, Akira
• Primary Examiner(s): Lightfoot; Elena T
• Application Number:
  US10/546,450
• Publication Number:
  US 20060147677A1
• Time in Patent Office: 2,223 Days
• Field of Search: 427/335, 427/337, 427/340, 427/372.2, 427/385.5, 427/487, 427/508
• US Class Current: 427/335
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: H01B 1/125 comprising aliphatic main chains, e.g. polyactylenes
• CPC Class Codes: H01B 1/127 comprising five-membered aromatic rings in the main chain, e.g. polypyrroles, polythiophenes
• CPC Class Codes: Y10T 428/24562 Interlaminar spaces
• CPC Class Codes: Y10T 428/24744 Longitudinal or transverse tubular cavity or cell

Abstract

A structured material characterized in having, on a substrate, a layer having tubular pores positioned uniaxially parallel to the interface of the substrate and the layer and supporting a conductive polymer material having a function of a surfactant therein. A method for producing the above structure material characterized by the steps of providing a substrate having the anisotropy on a surface, applying a solution containing a surfactant having a functional group for polymerization in the molecular structure, a solvent therefor, and a solute different from the surfactant to the substrate, and a step of standing for a predetermined time for causing the surfactant to assemble in a predetermined direction based on the anisotropy of the substrate.

Claims

1. A method for producing a structured material comprising steps of:

providing a substrate showing anisotropy on a surface;

then bringing the surface of the substrate into contact with a solution comprising a surfactant, which has a functional group for polymerization in a molecular structure, a solvent therefor, and a matrix raw material, which can form a matrix by hydrolysis and condensation; and

maintaining the contact for a predetermined time to form the matrix on the surface and to assemble the surfactant in the matrix in a predetermined direction based on the anisotropy of the substrate.

2. The method according to claim 1, wherein said surfactant has a diacetylene, thiophene, or pyrrole group in the molecular structure.

3. The method according to claim 1, wherein, in said maintaining step, the substrate is exposed to water vapor.

4. The method according to claim 1, further comprising a step of polymerizing the surfactant after the maintaining step.

5. The method according to claim 4, wherein said polymerizing step is executed by thermal polymerization, photopolymerization, or chemical polymerization.