Projection objective having a high aperture and a planar end surface
First Claim
Patent Images
1. A projection objective comprising:
- a plurality of optical elements transparent to radiation at an operating wavelength of the projection objective and including a lens starting from which a convergent beam path begins to converge and remains convergent up to an image plane, andan aperture diaphragm arranged at a distance of at least 10 mm from the lens and on the image side of the lens,wherein the operating wavelength is a deep ultraviolet wavelength λ
≧
193 nm, andwherein at least one of the optical elements has a refractive index n≧
1.6 at the operating wavelength.
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Abstract
A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.
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9 Claims
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1. A projection objective comprising:
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a plurality of optical elements transparent to radiation at an operating wavelength of the projection objective and including a lens starting from which a convergent beam path begins to converge and remains convergent up to an image plane, and an aperture diaphragm arranged at a distance of at least 10 mm from the lens and on the image side of the lens, wherein the operating wavelength is a deep ultraviolet wavelength λ
≧
193 nm, andwherein at least one of the optical elements has a refractive index n≧
1.6 at the operating wavelength. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A projection objective comprising:
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a plurality of optical elements transparent to radiation at an operating wavelength of the projection objective and including a lens starting from which a convergent beam path begins to converge and remains convergent up to an image plane, and a pupil plane arranged at a distance of at least 10 mm from the lens and on the image side of the lens, wherein the operating wavelength is a deep ultraviolet wavelength λ
≧
193 nm, andwherein at least one of the optical elements has a refractive index n≧
1.6 at the operating wavelength.
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Specification