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Generation of pattern data with no overlapping or excessive distance between adjacent dot patterns

  • US 7,787,079 B2
  • Filed: 08/07/2009
  • Issued: 08/31/2010
  • Est. Priority Date: 09/07/2001
  • Status: Expired due to Fees
First Claim
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1. A device for generating pattern data for unevenness that is randomly arranged on a reflecting surface, said device comprising:

  • a coordinate displacement device that generates a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between dot patterns;

    a pattern generator that arranges said dot patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement device to generate pattern data; and

    further comprising at least one of;

    (i) an entry confirmation device that determines whether or not a basic pitch P, a movable range R, and a dot diameter D, entered in connection with the limitation on the arrangement of patterns, satisfy the relationship;

    P≧

    2R+D;

    (ii) an arranging device that arranges the displaced coordinates in positions such that even-numbered rows of the displaced coordinates are displaced by one-half of said basic pitch in the column direction relative to odd-numbered rows of the displaced coordinates; and

    (iii) a displacement device that displaces said displaced coordinates such that half-width H of a distribution graph of the displacements of said displaced coordinates satisfies the relationship with said basic pitch P;

    0.3 P≦

    H≦

    0.9 P.

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