Real-time configurable masking
First Claim
1. A lithography system, comprising:
- an exposure tool to expose a wafer surface to a first beam via a mask, wherein the mask filters the first beam to project a circuit pattern, the circuit pattern comprising an undefined area designed for a circuit structure to complete;
a source of real-time configurable imaging to filter a second beam with a pattern defined by the circuit structure, to project the circuit structure onto a portion of the wafer surface that is associated with the undefined area; and
addressing circuitry to configure the source of real-time configurable imaging with the pattern based upon the circuit structure.
2 Assignments
0 Petitions
Accused Products
Abstract
Methods, systems, and media to define a portion of a circuit pattern with a source of real-time configurable imaging are disclosed. Embodiments include hardware and/or software for directing a beam through a mask onto a wafer surface to outline a circuit pattern having an undefined area, directing a second beam to the semiconductor wafer surface to define a circuit structure in the undefined area to complete the circuit pattern on the semiconductor wafer surface, and directing the second beam onto a source of real-time configurable imaging. Embodiments may also include a mask to include an undefined area incorporated into the circuit pattern to leave a critical structure of the circuit pattern undefined. Several embodiments include a photolithography system including an exposure tool, a mask, a source of real-time configurable imaging, and addressing circuitry.
-
Citations
14 Claims
-
1. A lithography system, comprising:
-
an exposure tool to expose a wafer surface to a first beam via a mask, wherein the mask filters the first beam to project a circuit pattern, the circuit pattern comprising an undefined area designed for a circuit structure to complete; a source of real-time configurable imaging to filter a second beam with a pattern defined by the circuit structure, to project the circuit structure onto a portion of the wafer surface that is associated with the undefined area; and addressing circuitry to configure the source of real-time configurable imaging with the pattern based upon the circuit structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
-
Specification