Substrate and mask aligning apparatus

• US 7,788,061 B2
• Filed: 07/24/2008
• Issued: 08/31/2010
• Est. Priority Date: 07/26/2007
• Status: Active Grant

• Current Assignee: Shinko Electric Industries Company Limited (Fujitsu Limited)
• Original Assignee: Shinko Electric Industries Company Limited (Fujitsu Limited)
• Inventors: Takeuchi, Yukiharu, Sakaguchi, Hideaki
• Primary Examiner(s): BHAT, ADITYA S
• Application Number:
  US12/178,767
• Publication Number:
  US 20090030640A1
• Time in Patent Office: 768 Days
• Field of Search: 702/150
• US Class Current: 702/150
• CPC Class Codes: B23K 3/0623 for shaped solder piece feeding, e.g. preforms, bumps, balls, pellets, droplets
• CPC Class Codes: H01L 2224/1132 Screen printing, i.e. using a stencil
• CPC Class Codes: H01L 2224/742 Apparatus for manufacturing bump connectors

Abstract

A substrate and mask aligning apparatus includes a controlling portion 70 for calculating moving data that are applied to eliminate a difference between a present superposed state of the through holes 52 of the mask 50, which comes into contact with the substrate 20 that is loaded on the stage 30, on the pads 22 of the substrate 20 and a scheduled superposed state on the basis of image data from the shooting section 40, 42 and then executing repeatedly an operation to move the stage 30 on the basis of the calculated moving data of the stage.

Claims

1. A substrate and mask aligning apparatus comprising:

a stage on which a substrate is loaded on one surface side such that a pad forming surface on which a plurality of pads are formed is directed upward and which is provided to move on a horizontal plane and provided to turn on a same plane;

a mask in which through holes are formed in portions corresponding to pads on the substrate that is loaded on the stage;

a connecting/disconnecting mechanism for connecting/disconnecting at least one of the substrate or the mask to/from the other;

a shooting section for shooting a superposed state of the through holes of the mask on the pads of the substrate in a state that the mask is brought into contact with the pad forming surface of the substrate loaded on the stage; and

a controlling portion for calculating stage moving data, which includes a moving direction and an amount of movement of the stage, on the basis of image data picked up by the shooting section to eliminate a difference between a present superposed state of the through holes of the mask, which comes into contact with the pad forming surface of the substrate loaded on the stage, on the pads of the substrate and a scheduled superposed state, and for executing repeatedly an operation to move the stage on the basis of calculated corrected moving data of the stage;

wherein first moving data necessary for first alignment between positions of the through holes of the mask and the pad forming surface of the substrate is calculated on the basis of both the image data of the sole substrate obtained by shooting the pad forming surface in a state that the substrate is loaded on the stage and the image data of the sole mask obtained by shooting a plane state of the sole mask, and

wherein the first moving data is calculated using data obtained in a state where no tension is applied to a mask, and the corrected moving data is calculated using data obtained in a state where a tension is applied to the mask.

2. The substrate and mask aligning apparatus according to claim 1, wherein the shooting section is constructed by at least two section, namely:

a first shooting section that shoots an image of the pad forming surface in a state that the substrate is loaded on the stage; and

a second shooting section that shoots a plane image of the mask and also that shoots a plane image in a state that the pad forming substrate of the substrate is brought into contact with the mask on the basis of the first moving data.

3. The substrate and mask aligning apparatus according to claim 1, wherein

a plurality of pad groups each of which is constructed by arranging a plurality of pads in a matrix fashion are arranged on the substrate in a square matrix fashion, and

in calculating the corrected moving data of the stage, the controlling portion extracts respective images of two pad groups, between which a separation distance becomes longest, out of the pad groups positioned at outermost peripheral corner portions of the pad groups in the image data picked up in a state that the mask is brought into contact with the pad forming surface of the substrate, and calculates the moving data on the basis of extracted image data.

4. The substrate and mask aligning apparatus according to claim 3, wherein

in calculating the corrected moving data of the stage, the controlling portion calculates moving data elements of the stage by applying a calculation individually to the extracted pad groups in the image data picked up in a state that the mask is brought into contact with the pad forming surface of the substrate, and then sets an average value of the moving data elements of the stage as the corrected moving data of the stage.

5. The substrate and mask aligning apparatus according to claim 1, wherein

a plurality of pad groups each of which is constructed by arranging a plurality of pads in a matrix fashion are arranged on the substrate in a square matrix fashion, and

in calculating the corrected moving data of the stage, the controlling portion extracts images of the pad groups positioned at all corner portions in an outermost periphery of the pad groups in the image data picked up in a state that the mask is brought into contact with the pad forming surface of the substrate, and calculates the corrected moving data on the basis of extracted image data.

6. The substrate and mask aligning apparatus according to claim 5, wherein

in calculating the corrected moving data of the mask, the controlling portion calculates moving data elements of the mask by applying a calculation individually to the extracted pad groups in the image data picked up in a state that the mask is brought into contact with the pad forming surface of the substrate, and then sets an average value of the moving data elements of the mask as the corrected moving data of the mask.

7. A substrate and mask aligning apparatus comprising:

a stage on which a substrate is loaded on one surface side such that a pad forming surface on which a plurality of pads are formed is directed upward;

a mask in which through holes are formed in portions corresponding to pads on the substrate that is loaded on the stage;

a mask moving mechanism provided to move the mask on a horizontal plane, and provided to turn on a same plane;

a connecting/disconnecting mechanism for connecting/disconnecting at least one of the substrate or the mask to/from the other;

a shooting section for shooting a superposed state of the through holes of the mask on the pads of the substrate in a state that the mask is brought into contact with the pad forming surface of the substrate loaded on the stage; and

a controlling portion for calculating mask moving data, which includes a moving direction and an amount of movement of the mask moving mechanism, on the basis of image data picked up by the shooting section to eliminate a difference between a present superposed state of the through holes of the mask, which comes into contact with the pad forming surface of the substrate loaded on the stage, on the pads of the substrate and a scheduled superposed state, and for executing repeatedly an operation to move the mask moving mechanism on the basis of calculated corrected moving data of the mask;

wherein first moving data necessary for first alignment between positions of the through holes of the mask and the pad forming surface of the substrate is calculated on the basis of both the image data of the sole substrate obtained by shooting the pad forming surface in a state that the substrate is loaded on the stage and the image data of the sole mask obtained by shooting a plane state of the sole mask, and

wherein the first moving data is calculated using data obtained in a state where no tension is applied to a mask, and the corrected moving data is calculated using data obtained in a state where a tension is applied to the mask.

8. The substrate and mask aligning apparatus according to claim 7, wherein the shooting section is constructed by at least two section, namely

a first shooting section that shoots an image of the pad forming surface in a state that the substrate is loaded on the stage;

and

a second shooting section that shoots a plane image of the mask and also that shoots a plane image in a state that the pad forming substrate of the substrate is brought into contact with the mask on the basis of the first moving data.

9. The substrate and mask aligning apparatus according to claim 7, wherein

a plurality of pad groups each of which is constructed by arranging a plurality of pads in a matrix fashion are arranged on the substrate in a square matrix fashion, and

in calculating the corrected moving data of the mask, the controlling portion extracts respective images of two pad groups, between which a separation distance becomes longest, out of the pad groups positioned at outermost peripheral corner portions of the pad groups in the image data picked up in a state that the mask is brought into contact with the pad forming surface of the substrate, and calculates the corrected moving data on the basis of extracted image data.

10. The substrate and mask aligning apparatus according to claim 9, wherein

in calculating the corrected moving data of the mask, the controlling portion calculates moving data elements of the mask by applying a calculation individually to the extracted pad groups in the image data picked up in a state that the mask is brought into contact with the pad forming surface of the substrate, and then sets an average value of the moving data elements of the mask as the moving data of the mask.

11. The substrate and mask aligning apparatus according to claim 7, wherein

a plurality of pad groups each of which is constructed by arranging a plurality of pads in a matrix fashion are arranged on the substrate in a square matrix fashion, and

in calculating the corrected moving data of the mask, the controlling portion extracts images of the pad groups positioned at all corner portions in an outermost periphery of the pad groups in the image data picked up in a state that the mask is brought into contact with the pad forming surface of the substrate, and calculates the corrected moving data on the basis of extracted image data.

12. The substrate and mask aligning apparatus according to claim 11, wherein

in calculating the corrected moving data of the mask, the controlling portion calculates moving data elements of the mask by applying a calculation individually to the extracted pad groups in the image data picked up in a state that the mask is brought into contact with the pad forming surface of the substrate, and then sets an average value of the moving data elements of the mask as the corrected moving data of the mask.