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Method and apparatus for angular-resolved spectroscopic lithography characterization

  • US 7,791,727 B2
  • Filed: 08/16/2004
  • Issued: 09/07/2010
  • Est. Priority Date: 08/16/2004
  • Status: Active Grant
First Claim
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1. A scatterometer, comprising:

  • a lens configured to direct a radiation beam from a radiation source toward a pattern formed on a substrate; and

    a detector located in a pupil plane of the lens and configured to detect an angle-resolved spectrum of the radiation beam reflected from the pattern,wherein a property of the substrate is measured using the detector by measuring asymmetries between intensities of corresponding diffraction orders diffracted from the pattern in the reflected angle-resolved spectrum.

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