Lithographic apparatus and device manufacturing method
First Claim
Patent Images
1. A method of patterning a substrate, the method comprising:
- measuring at a measurement station a height, a tilt, or both, of each of a plurality of points on the substrate, wherein the measuring is not performed through liquid adjacent to the substrate;
moving the substrate from the measurement station to an exposure station;
providing a liquid at the exposure station in a space between a projection system and the substrate;
moving one or more of the plurality of points to a focal point of the projection system based on the measuring; and
projecting a patterned beam through the liquid onto a target portion of the substrate.
1 Assignment
0 Petitions
Accused Products
Abstract
A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
-
Citations
18 Claims
-
1. A method of patterning a substrate, the method comprising:
-
measuring at a measurement station a height, a tilt, or both, of each of a plurality of points on the substrate, wherein the measuring is not performed through liquid adjacent to the substrate; moving the substrate from the measurement station to an exposure station; providing a liquid at the exposure station in a space between a projection system and the substrate; moving one or more of the plurality of points to a focal point of the projection system based on the measuring; and projecting a patterned beam through the liquid onto a target portion of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
-
-
10. A method of patterning a substrate, the method comprising:
-
measuring at a measurement station a height, a tilt, or both, of each of a plurality of points on a first substrate, wherein the measuring is not performed through liquid adjacent to the substrate; moving the first substrate from the measurement station to an exposure station physically separated from the measurement station; providing a liquid at the exposure station in a space between a projection system and the first substrate; moving one or more of the plurality of points of the first substrate to a focal point of the projection system based on the measuring; projecting a patterned beam through the liquid onto a target portion of the first substrate; and measuring a second substrate at the measurement station at least partially overlapping in time with exposure of the first substrate at the exposure station. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17)
-
-
18. A method of patterning a substrate, the method comprising:
-
measuring at a measurement station a height, a tilt, or both, of each of a plurality of points on the substrate, wherein the measuring is not performed through liquid adjacent to the substrate; applying a correction to the measuring to account for the absence of liquid adjacent to the substrate; moving the substrate from the measurement station to an exposure station; providing a liquid at the exposure station in a space between a projection system and the substrate; moving one or more of the plurality of points to a focal point of the projection system based on the measuring; and projecting a patterned beam through the liquid onto a target portion of the substrate.
-
Specification