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Semiconductor device with oxidized regions and method for fabricating the same

  • US 7,795,630 B2
  • Filed: 08/06/2004
  • Issued: 09/14/2010
  • Est. Priority Date: 08/07/2003
  • Status: Expired due to Fees
First Claim
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1. A semiconductor device comprising:

  • an active layer made of a first group III-nitride semiconductor layer formed on a substrate,crystal defects existing in the active layer, andoxidized layers formed on the active layer,wherein the oxidized layers are located separately from each other, each of the oxidized layers being formed selectively around each of the crystal defects, anda vertical size of each of the oxidized layers has a local maximum value at each of the crystal defects,wherein the local maximum value occurs only at one position of each of the oxidized layers, andthe oxidized layers penetrate the active layer.

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