Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool

• US 7,798,096 B2
• Filed: 05/05/2006
• Issued: 09/21/2010
• Est. Priority Date: 05/05/2006
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: McDougall, Brendan, Mahajani, Maitreyee, Yudovsky, Joseph
• Primary Examiner(s): Hassanzadeh; Parviz
• Assistant Examiner(s): CROWELL, ANNA M
• Application Number:
  US11/381,970
• Publication Number:
  US 20070259110A1
• Time in Patent Office: 1,600 Days
• Field of Search: 118/723.E
• US Class Current: 118/723.00E
• CPC Class Codes: C23C 16/45508 Radial flow
• CPC Class Codes: C23C 16/45574 Nozzles for more than one gas
• CPC Class Codes: C23C 16/4583 the substrate being supported substantially horizontally
• CPC Class Codes: C23C 16/46 characterised by the method used for heating the substrate C23C16/48, C23C16/50 take precedence
• CPC Class Codes: C23C 16/509 using internal electrodes
• CPC Class Codes: H01J 37/32009 Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources plasma generation in general H05H1/24

Abstract

A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing and may include plasma, UV, or ion assistance.

Claims

1. A batch chamber for processing a plurality of substrates, comprising:

a chamber housing containing a process region;

a substrate boat in the process region for holding a batch of substrates vertically stacked; and

an excitation assembly for exciting species of a processing gas introduced in the process region, and positioned within the chamber housing, wherein the excitation assembly comprises an anode unit and a cathode unit wherein at least one of the cathode unit or anode unit configured to diffuse the processing gas introduced in the process region and wherein at least one of the anode unit or the cathode unit extends along the vertical direction of the substrate boat.

2. The chamber of claim 1, further comprising an inner chamber containing the process region, wherein the excitation assembly is positioned in the inner chamber.

3. The chamber of claim 1, wherein the excitation assembly is positioned adjacent to the process region.

4. The chamber of claim 1, further comprising an injector assembly for introducing the processing gas into the process region, and wherein the excitation assembly is positioned in the injector assembly.

5. The chamber of claim 1, further comprising an injector assembly and an exhaust assembly for the processing gas, wherein the excitation assembly is configured to excite the species of the processing gas between the injector assembly and the exhaust assembly.

6. The chamber of claim 1, wherein the anode unit and the cathode unit are adapted to provide excited species along the vertical direction of the substrate boat.

7. The chamber of claim 6, wherein the anode unit extends substantially vertically along the process region and the cathode unit extends substantially vertically along the process region.

8. The chamber of claim 1, wherein the cathode unit is displaced horizontally with respect to the anode unit.

9. The chamber of claim 1, wherein the excitation assembly is a plasma source.

10. The chamber of claim 1, wherein the excitation assembly further comprising a UV source.

11. The chamber of claim 10, wherein the UV source is a hollow cathode glow charge UV source.

12. The chamber of claim 1, wherein the excitation assembly further comprising an ion source.

13. The chamber of claim 1, further comprising an injector assembly for introducing the processing gas into the process region, wherein the anode unit is a faceplate of the injector assembly.

14. The chamber of claim 1, further comprising an injector assembly for injecting processing gas into the process region wherein the cathode unit is a faceplate of the injector assembly.

15. The chamber of claim 1, further comprising an injector assembly for the processing gas, wherein the injector assembly and the diffuser are positioned to confine a plasma there between.

16. The chamber of claim 1, further comprising an injector assembly for the processing gas, wherein the cathode unit is a mesh disposed between the injector assembly and the substrate boat.

17. The chamber of claim 16, wherein the injector assembly and the mesh are positioned to confine a plasma therebetween.

18. The chamber of claim 1, wherein the cathode unit is a rod assembly.

19. The chamber of claim 1, wherein the cathode unit is an exhaust assembly for the processing gas.

32. The chamber of claim 1, wherein the excitation assembly further comprising an ion source.

20. A batch chamber for processing a plurality of substrates, comprising:

a chamber housing containing a process region;

an injector assembly within the chamber housing for injecting a processing gas into the process region and having an inlet channel and a faceplate;

a substrate boat in the process region for holding a batch of substrates; and

an excitation assembly for exciting species of the processing gas, and positioned in the injector assembly, wherein the faceplate is configured as an anode unit or a cathode unit of the excitation assembly; and

wherein the faceplate extends along the vertical direction of the substrate boat.

21. The chamber of claim 20, wherein the excitation assembly is positioned adjacent to the process region.

22. The chamber of claim 20, wherein the excitation assembly comprises an anode unit and a cathode unit adapted to provide the excited species along the vertical direction of the substrate boat.

23. The chamber of claim 22, wherein the anode unit extends substantially vertically along the process region and the cathode unit extends substantially vertically along the process region.

24. The chamber of claim 20, wherein the substrate boat is configured to hold the wafers in a vertically stacked manner within the process region and the excitation assembly comprises an anode unit and a cathode unit displaced horizontally with respect to the anode unit.

25. The chamber of claim 20, wherein the substrate boat is configured to stack the wafers vertically;

and

wherein the excitation assembly comprises an anode unit and a cathode unit displaced vertically with respect to the anode unit.

26. The chamber of claim 20, wherein the excitation assembly is a plasma source.

27. The chamber of claim 26, wherein the plasma source comprises electrodes positioned in a cavity of the injector assembly.

28. The chamber of claim 20, wherein the excitation assembly further comprising a UV source.

29. The chamber of claim 28, wherein the UV source is a hollow cathode glow charge UV source.

30. The chamber of claim 28, wherein the UV source comprises at least two UV lamps.

31. The chamber of claim 30, wherein the UV lamps are positioned in a cavity of the injector assembly.