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Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings

  • US 7,804,646 B2
  • Filed: 01/31/2007
  • Issued: 09/28/2010
  • Est. Priority Date: 01/31/2006
  • Status: Expired due to Fees
First Claim
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1. A method of determining diffractive optical elements to be utilized in an imaging process, said method comprising the steps of:

  • defining a customized diffractive optical element which is based on a target pattern to be printed during said imaging process;

    decomposing said customized diffractive optical element into one or more standard diffractive optical elements; and

    defining an exposure dose to be assigned to each of said one or more standard diffractive optical elements,wherein the one or more standard diffractive optical elements are adapted to adjust characteristics of radiation that projects from an illumination source in the imaging process, and wherein the radiation, after it has been projected from the illumination source, illuminates a mask having features corresponding to the target pattern during the imaging process, so as to print the target pattern on a wafer.

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