×

Test pattern of CMOS image sensor and method of measuring process management using the same

  • US 7,807,996 B2
  • Filed: 10/11/2006
  • Issued: 10/05/2010
  • Est. Priority Date: 10/11/2005
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method of measuring process management of the fabrication of a CMOS image sensor, comprising:

  • forming a test pattern of a CMOS image sensor, wherein the test pattern comprises an opaque metal film pattern formed on a semiconductor substrate, an insulating film formed on the semiconductor substrate and the metal film pattern, a single-color filter formed on the insulating film, the single-color filter being only a red color filter, a planarization layer formed on the insulating film and the single-color filter, and a number of micro-lenses formed on the planarization layer; and

    scanning the test pattern at a plurality of angles using a light source of short wavelength, detecting a scattered beam, and measuring the process management of the micro-lenses and the color filter.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×