Self-correcting multivariate analysis for use in monitoring dynamic parameters in process environments
First Claim
1. A method of process monitoring, comprising:
- generating a multivariate analysis reference model of a process environment from data corresponding to monitored parameters of the process environment;
identifying at least one, but less than all, of the monitored parameters having an expected maturation path that correlates to an expected maturation path of the process environment;
collecting current process data corresponding to the monitored parameters, including the at least one identified parameter; and
mathematically manipulating the multivariate reference model based on the current process data limited to the at least one identified parameter to account for the expected maturation path of the process environment.
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Abstract
A method and apparatus for process monitoring are provided. Process monitoring includes (i) generating a multivariate analysis reference model of a process environment from data corresponding to monitored parameters of the process environment; (ii) designating at least one of the monitored parameters as being correlated to maturation of the process environment; (iii) collecting current process data corresponding to the monitored parameters, including the at least one designated parameter; and (iv) scaling the multivariate reference model based on the current process data of the at least one designated parameter to account for maturation of the process environment. The method further includes generating one or more current multivariate analysis process metrics that represent a current state of the process environment from the current process data; and comparing the current process metrics to the scaled reference model to determine whether the current state of the process environment is acceptable.
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Citations
20 Claims
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1. A method of process monitoring, comprising:
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generating a multivariate analysis reference model of a process environment from data corresponding to monitored parameters of the process environment; identifying at least one, but less than all, of the monitored parameters having an expected maturation path that correlates to an expected maturation path of the process environment; collecting current process data corresponding to the monitored parameters, including the at least one identified parameter; and mathematically manipulating the multivariate reference model based on the current process data limited to the at least one identified parameter to account for the expected maturation path of the process environment. - View Dependent Claims (2, 3, 4, 5, 16)
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6. A method of semiconductor process monitoring, comprising:
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generating a multivariate analysis reference model of a semiconductor process chamber from data corresponding to monitored parameters of the semiconductor process chamber; identifying at least one, but less than all, of the monitored parameters having an expected maturation path that correlates to an expected maturation path of the semiconductor process chamber; collecting current process data corresponding to the monitored parameters of the process chamber, including the at least one identified parameter; and mathematically manipulating the multivariate reference model based on the current process data limited to the at least one identified parameter to account for the expected maturation path of the semiconductor process chamber. - View Dependent Claims (7, 17)
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8. An apparatus for process monitoring, comprising:
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a multivariate analysis module capable of generating a multivariate analysis reference model of a process environment from data corresponding to monitored parameters of the process environment; the multivariate analysis module being capable of receiving an identification of at least one, but less than all, of the monitored parameters having an expected maturation path that correlates to an expected maturation path of the process environment; a process interface capable of collecting current process data corresponding to the monitored parameters, including the at least one identified parameter; and the multivariate analysis module being capable of mathematically manipulating the multivariate reference model based on the current process data limited to the at least one identified parameter to account for the expected maturation path of the process environment. - View Dependent Claims (9, 10, 11, 12, 18)
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13. An apparatus for semiconductor process monitoring, comprising:
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a multivariate analysis module capable of generating a multivariate analysis reference model of a semiconductor process chamber from data corresponding to monitored parameters of the semiconductor process chamber; the multivariate analysis module being capable of receiving an identification of at least one, but less than all, of the monitored parameters having an expected maturation path that correlates to an expected maturation path of the semiconductor process chamber; a process interface capable of collecting current process data corresponding to the monitored parameters of the process chamber, including the at least one identified parameter; and the multivariate analysis module being capable of mathematically manipulating the multivariate reference model based on the current process data limited to the at least one identified parameter to account for the expected maturation path of the semiconductor process chamber. - View Dependent Claims (14, 19)
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15. A process monitor, comprising:
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means for generating a multivariate analysis reference model of a desired process environment from data corresponding to monitored parameters of the desired process environment; means for identifying at least one, but less than all, of the monitored parameters having an expected maturation path that correlates to an expected maturation path of the process environment; means for collecting current process data corresponding to the monitored parameters, including the at least one identified parameter; and means for mathematically manipulating the multivariate reference model based on the current process data limited to the at least one identified parameter to account for the expected maturation path of the process environment. - View Dependent Claims (20)
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Specification