Nanostructured working electrode of an electrochemical sensor, method of manufacturing thereof and sensor containing this working electrode

• US 7,811,431 B2
• Filed: 05/05/2006
• Issued: 10/12/2010
• Est. Priority Date: 05/09/2005
• Status: Expired due to Fees

• Current Assignee: BVT Technologies, A.S., Prirodovedecka Fakulta Univerzita Jana Evangelisty Purkyne
• Original Assignee: BVT Technologies, A.S., Prirodovedecka Fakulta Univerzita Jana Evangelisty Purkyne
• Inventors: Krejci, Jan, Stejskalova, Radka, Maly, Jan
• Primary Examiner(s): Ruddock; Ula C
• Assistant Examiner(s): DIETERLE, JENNIFER M
• Application Number:
  US11/913,086
• Publication Number:
  US 20080169191A1
• Time in Patent Office: 1,621 Days
• Field of Search: 205/775, 205/920, 205/915, 204400-435, 204/292, 204/293, 204/403.01, 427/77, 156/62.2
• US Class Current: 204/403.01
• CPC Class Codes: B82Y 15/00 Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: G01N 27/3278 involving nanosized elements, e.g. nanogaps or nanoparticles nanopores G01N33/48721; magnetic beads G01N27/745
• CPC Class Codes: G01N 33/5438 Electrodes

Abstract

A nanostructured working electrode of an electrochemical sensor wherein the working electrode is composed of a material in the form of a film and is inserted onto the sensor. The electrode can be prepared from materials the use of which was impossible in the working electrodes known in the art (e.g. metals of defined purity). A method of manufacturing of the nanostructured working electrode and an electrochemical sensor containing the nanostructured electrode is disclosed.

Claims

1. A method of manufacturing of a nanostructured working electrode of an electrochemical sensor, said electrode having an active surface composed of a nanostructured material in the form of a film of the thickness of 0.1-100 μ

m, the method comprising;

cutting planar shapes from the nanostructured material in the form of a film having the thickness of 0.1 - 100 μ

m, the planar shapes being by 1-1000 μ

m larger than the desired area of the active surface of the working electrode, applying a carrier paste onto the place of the working electrode on a pad, inserting onto said carrier paste the planar shape with a micromanipulator hardening, the working electrode and, subsequently, overprinting a part of the surface of the working electrode with a dielectric paste and hardening again.

2. The method of manufacturing of the nanostructructured working electrode of the electrochemical sensor according to claim 1, wherein the carrier paste does not contain volatiles.

3. The method of manufacturing of the nanostructructured working electrode of the electrochemical sensor according to claim 1, wherein during the first hardening step, the working electrode is fixed to the pad by sintering the carrier paste further containing particles of gold and/or platinum and/or silver at the temperature 350 - 1000°

C.

4. The method of manufacturing of the nanostructructured working electrode of the electrochemical sensor according to claim 1, wherein an undercut is carved into the pad to maintain-the nanostructructured working electrode level with the pad.

5. The method of manufacturing of the nanostructured working electrode of the electrochemical sensor according to claim 1, wherein the planar shape further includes a protective layer that is removed after cutting the planar shape from the film and before inserting the planar shape with the micromanipulator.

6. The method of manufacturing of the nanostructured working electrode of the electrochemical sensor according to claim 1, wherein the film is prepared from an element selected from the group containing metals of the groups IA, IIA, IIIA, IVA, VA, IIIB, IVB, VB, VIB, VIIB, VIIIB, IB and IIB of the periodic table, lanthanoids and semi-metal and non-metallic elements of the groups IIIA and IVA of the periodic table.

7. The method according to claim 1, wherein the film is prepared from an alloy of at least two metals selected from the group containing metals of the groups IA, IIA, IIIA, IVA, VA, IIIB, IVB, VB, VIB, VIIB, VIIIB, IB and IIB of the periodic table.

8. The method according to claim 1, wherein the film is prepared from a magnetic alloy having high permeability.

9. The method according to claim 1, wherein the film is prepared from a high-temperature superconductor.

10. The method according to claim 1, wherein further structures are applied or immobilized on the film.