Method for fast filling of templates for imprint lithography using on template dispense

• US 7,811,505 B2
• Filed: 04/07/2005
• Issued: 10/12/2010
• Est. Priority Date: 12/07/2004
• Status: Active Grant

• Current Assignee: Mii Newco, Inc.
• Original Assignee: Molecular Imprints, Inc. (Canon Inc.)
• Inventors: Lad, Pankaj B., Truskett, Van N., McMackin, Ian M.
• Primary Examiner(s): Daniels; Matthew J.
• Application Number:
  US11/101,140
• Publication Number:
  US 20060121728A1
• Time in Patent Office: 2,014 Days
• Field of Search: 264/293, 264/319, 264/494, 264/496, 977/887, 101/151, 101/152, 101/154, 101/161, 101/164, 101/167, 101/169, 101/170
• US Class Current: 264/496
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: Y10S 977/887 Nanoimprint lithography, i.e. nanostamp

Abstract

A method of depositing material upon a substrate features filling recesses of a substrate with liquid and removing material present on the substrate, outside of the recesses using fluid, i.e., apply a vacuum of a jet of fluid. To that end, one method of the present invention includes depositing a measure of liquid upon a surface of a substrate having a recess formed therein to ingress into a volume of the recess with a portion of the liquid. A quantity of the liquid is disposed upon regions of the surface proximate to the recess. Thereafter, the quantity of liquid is removed while maintaining the portion within the volume. In this manner, the portion may be transferred onto an additional substrate. More specifically, the portion may be placed in contact with a layer of flowable material and cross-linking therewith by exposing the liquid and the flowable material to actinic radiation.

Claims

1. A method of depositing material upon a template in an imprint lithography system, said template employing a feature mold having a recess formed into a surface thereof, said method comprising:

depositing a measure of liquid upon said surface whereby a portion of said liquid flows into a volume of said recess and an excess quantity of said liquid is disposed upon regions of said surface proximate to said recess;

positioning an apparatus in superimposition with said template a controllable distance above said surface, said apparatus having a slot extending across a length of said mold, and said apparatus having at least one air bearing located in superimposition with a region of said template outside of said mold wherein said air bearing is coplanar with said mold;

removing said excess quantity of said liquid, using a fluid flow directed through said slot, while maintaining said portion of said liquid within said volume.

2. The method as recited in claim 1 wherein depositing further includes filling said volume with said portion of said liquid.

3. The method as recited in claim 1 wherein removing further includes applying a vacuum to drive said fluid through said slot to act upon said excess quantity of said liquid.

4. The method as recited in claim 1, wherein removing further includes applying a pressure to drive said fluid through said slot to act to upon said excess quantity of said liquid.

5. The method as recited in claim 1 wherein said measure of said liquid is greater than said volume of said recess.

6. The method as recited in claim 1 further including transferring said portion of said liquid onto a substrate.

7. The method as recited in claim 1 further including placing said portion of liquid in contact with a layer of flowable material and cross-linking said liquid portion with said flowable material.

8. The method as recited in claim 7 wherein cross-linking further includes exposing said liquid portion and said flowable material to actinic radiation.

9. The method as recited in claim 7 wherein said liquid portion and said flowable material are polymerizable and cross-linkable in response to actinic radiation.

10. A method of depositing material upon a template in an imprint lithography system, said template employing a featured mold having a recess formed into a surface thereof, said method comprising:

depositing a measure of liquid upon said surface thereby directing a portion of said liquid into a volume of said recess, wherein an excess quantity of said liquid is disposed upon regions of said surface proximate to said recess; and

positioning an apparatus in superimposition with said template a controllable distance above said surface, said apparatus having a slot extending across a length of said mold, and said apparatus having at least one air bearing, the air bearing positioned in superimposition with a region of said template outside of said mold wherein said air bearing is coplanar with said mold;

removing said excess quantity of said liquid, using a fluid flow directed through said slot while maintaining said portion of said liquid within said volume, wherein said air bearing creates a positive flow of fluid impinging upon said template pushing said apparatus in a direction opposite from said template.

11. The method as recited in claim 10 further including transferring said portion of said liquid onto a substrate.

12. The method as recited in claim 10 wherein depositing further includes filling said volume with said portion of said liquid.

13. The method as recited in claim 10 wherein removing further includes applying a vacuum to drive said fluid flow through said slot to act upon said excess quantity of said liquid.

14. The method as recited in claim 10 wherein removing further includes applying pressure to drive said fluid through said slot to act to upon said excess quantity of said liquid.

15. The method as recited in claim 10 wherein said measure is greater than said volume.

16. The method as recited in claim 10 further including placing said portion in contact with a layer of flowable material and cross-linking said liquid portion with said flowable material by exposing said liquid and said flowable material to actinic radiation.

17. A method of depositing material upon a template in an imprint lithography system, employing a featured mold having a recess formed into a surface thereof, said method comprising:

filling said recess with a volume of a liquid wherein regions of said surface proximate to said recess receive an excess quantity of said liquid;

positioning an apparatus in superimposition with said template a controllable distance above said surface, said apparatus having a slot extending across a length of said mold, and said apparatus having at least two air bearings, the air bearings located in superimposition with a region of said template such that said mold is positioned between said air bearings wherein said air bearings are coplanar with said mold; and

removing said excess quantity of said liquid, using a fluid flow directed through a slot while maintaining said portion of said liquid within said volume.

18. The method as recited in claim 17 further including placing said volume of said liquid in contact with a layer of flowable material and cross-linking volume of said liquid with said flowable material by exposing said volume of said liquid to actinic radiation.

19. The method as recited in claim 18 wherein removing further includes applying a vacuum to drive said fluid flow through said slot to act upon said excess quantity of liquid.

20. The method as recited in claim 18 wherein removing further includes applying a pressure to drive said fluid through said slot to act to upon said excess quantity of said liquid.