Gas barrier laminated film and process for producing the same
First Claim
1. A gas barrier laminated film comprising a base material, a vapor deposited film of an inorganic oxide provided on the base material, and a gas barrier coating film provided on the vapor deposited film,wherein said base material on its side where the vapor deposited film is provided, has been subjected to pretreatment or primer coating treatment,wherein said gas barrier coating film has been formed by coating a gas barrier coating liquid onto the inorganic oxide film and then heating the coating,wherein the vapor deposited film is composed mainly of silicon oxide and further contains, through a chemical bond, at least one compound comprising one or more elements of carbon, hydrogen, silicon and oxygen, andwherein the content of the compound is reduced from the surface of the vapor deposited film in the thickness direction thereof toward the base material.
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Accused Products
Abstract
There are provided a gas barrier laminated film, which is transparent while possessing excellent gas barrier properties and, at the same time, has excellent impact resistance, and a process for producing the same. The gas barrier laminated film comprises a base material, a vapor deposited film of an inorganic oxide provided on the base material, and a gas barrier coating film provided on the vapor deposited film. The gas barrier laminated film is characterized in that the base material on its side where the vapor deposited film is provided, has been subjected to pretreatment or primer coating treatment, and the gas barrier coating film has been formed by coating a gas barrier coating liquid onto the inorganic oxide film and then heating the coating.
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Citations
27 Claims
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1. A gas barrier laminated film comprising a base material, a vapor deposited film of an inorganic oxide provided on the base material, and a gas barrier coating film provided on the vapor deposited film,
wherein said base material on its side where the vapor deposited film is provided, has been subjected to pretreatment or primer coating treatment, wherein said gas barrier coating film has been formed by coating a gas barrier coating liquid onto the inorganic oxide film and then heating the coating, wherein the vapor deposited film is composed mainly of silicon oxide and further contains, through a chemical bond, at least one compound comprising one or more elements of carbon, hydrogen, silicon and oxygen, and wherein the content of the compound is reduced from the surface of the vapor deposited film in the thickness direction thereof toward the base material.
Specification