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Gas barrier laminated film and process for producing the same

  • US 7,811,669 B2
  • Filed: 08/15/2005
  • Issued: 10/12/2010
  • Est. Priority Date: 08/17/2004
  • Status: Active Grant
First Claim
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1. A gas barrier laminated film comprising a base material, a vapor deposited film of an inorganic oxide provided on the base material, and a gas barrier coating film provided on the vapor deposited film,wherein said base material on its side where the vapor deposited film is provided, has been subjected to pretreatment or primer coating treatment,wherein said gas barrier coating film has been formed by coating a gas barrier coating liquid onto the inorganic oxide film and then heating the coating,wherein the vapor deposited film is composed mainly of silicon oxide and further contains, through a chemical bond, at least one compound comprising one or more elements of carbon, hydrogen, silicon and oxygen, andwherein the content of the compound is reduced from the surface of the vapor deposited film in the thickness direction thereof toward the base material.

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