Sidewall structured switchable resistor cell
First Claim
1. A memory device, comprising:
- a first conductive electrode;
an insulating structure;
a resistivity switching element located on a sidewall of the insulating structure;
a second conductive electrode located over the resistivity switching element; and
a steering element located in series with the resistivity switching element between the first conductive electrode and the second conductive electrode;
wherein a height of the resistivity switching element in a first direction from the first conductive electrode to the second conductive electrode is greater than a thickness of the resistivity switching element in second direction perpendicular to the first direction,wherein the insulating structure comprises a plurality of insulating rails, and the resistivity switching element is located on the sidewall of at least one insulating rail and in contact with the first conductive electrode exposed between adjacent rails,wherein a space between the plurality of insulating rails is filled with an insulating filler material and each insulating rail is partially misaligned with the first conductive electrode and the steering element such that the resistivity switching element is located in contact with the first conductive electrode and the steering element.
4 Assignments
0 Petitions
Accused Products
Abstract
A method of making a memory device includes forming a first conductive electrode, forming an insulating structure over the first conductive electrode, forming a resistivity switching element on a sidewall of the insulating structure, forming a second conductive electrode over the resistivity switching element, and forming a steering element in series with the resistivity switching element between the first conductive electrode and the second conductive electrode, wherein a height of the resistivity switching element in a first direction from the first conductive electrode to the second conductive electrode is greater than a thickness of the resistivity switching element in second direction perpendicular to the first direction.
-
Citations
8 Claims
-
1. A memory device, comprising:
-
a first conductive electrode; an insulating structure; a resistivity switching element located on a sidewall of the insulating structure; a second conductive electrode located over the resistivity switching element; and a steering element located in series with the resistivity switching element between the first conductive electrode and the second conductive electrode; wherein a height of the resistivity switching element in a first direction from the first conductive electrode to the second conductive electrode is greater than a thickness of the resistivity switching element in second direction perpendicular to the first direction, wherein the insulating structure comprises a plurality of insulating rails, and the resistivity switching element is located on the sidewall of at least one insulating rail and in contact with the first conductive electrode exposed between adjacent rails, wherein a space between the plurality of insulating rails is filled with an insulating filler material and each insulating rail is partially misaligned with the first conductive electrode and the steering element such that the resistivity switching element is located in contact with the first conductive electrode and the steering element. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
Specification