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Exposure apparatus, and device manufacturing method

  • US 7,812,925 B2
  • Filed: 01/26/2006
  • Issued: 10/12/2010
  • Est. Priority Date: 06/19/2003
  • Status: Expired due to Fees
First Claim
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1. A lithographic projection apparatus comprising:

  • an illumination system that conditions a radiation beam;

    a support structure that holds a patterning device, the patterning device imparting the radiation beam with a pattern;

    a substrate table on which a substrate is held;

    a projection system that projects the patterned radiation beam onto a target portion of the substrate held by the substrate table; and

    a liquid supply system that provides a liquid to a space between the projection system and the substrate, whereinthe liquid supply systemcomprises a member and a liquid inlet in the member that supplies a liquid between the member and the substrate, andprevents the liquid from leaking from between the member and a part of the substrate, andthe liquid held between the member and the part of the substrate moves, as a whole, on the substrate by movement of the substrate table.

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