Exposure apparatus, and device manufacturing method
First Claim
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1. A lithographic projection apparatus comprising:
- an illumination system that conditions a radiation beam;
a support structure that holds a patterning device, the patterning device imparting the radiation beam with a pattern;
a substrate table on which a substrate is held;
a projection system that projects the patterned radiation beam onto a target portion of the substrate held by the substrate table; and
a liquid supply system that provides a liquid to a space between the projection system and the substrate, whereinthe liquid supply systemcomprises a member and a liquid inlet in the member that supplies a liquid between the member and the substrate, andprevents the liquid from leaking from between the member and a part of the substrate, andthe liquid held between the member and the part of the substrate moves, as a whole, on the substrate by movement of the substrate table.
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Abstract
A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.
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Citations
32 Claims
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1. A lithographic projection apparatus comprising:
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an illumination system that conditions a radiation beam; a support structure that holds a patterning device, the patterning device imparting the radiation beam with a pattern; a substrate table on which a substrate is held; a projection system that projects the patterned radiation beam onto a target portion of the substrate held by the substrate table; and a liquid supply system that provides a liquid to a space between the projection system and the substrate, wherein the liquid supply system comprises a member and a liquid inlet in the member that supplies a liquid between the member and the substrate, and prevents the liquid from leaking from between the member and a part of the substrate, and the liquid held between the member and the part of the substrate moves, as a whole, on the substrate by movement of the substrate table. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A lithographic projection apparatus comprising:
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an illumination system that conditions a radiation beam; a support structure that holds a patterning device, the patterning device imparting the radiation beam with a pattern; a substrate table on which a substrate is held; a projection system that projects the patterned radiation beam onto a target portion of the substrate held by the substrate table; a liquid supply system that provides a liquid to a space between the projection system and the substrate, the liquid supply system comprising a member, wherein the member comprises a liquid inlet located on a surface of the member which extends parallel to and faces the substrate; and a sensor that determines a distance between the substrate and the member. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23)
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24. A device manufacturing method comprising:
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providing a liquid to a space between a projection system of a lithographic apparatus and a substrate, the space being bounded at least in part by a member; supplying, from an inlet in the member, a liquid between the member and the substrate to prevent the liquid from leaking from between the member and a part of the substrate, the liquid held between the member and the part of the substrate; and projecting a patterned radiation beam, using the projection system, through the liquid onto a target portion of the substrate, wherein the liquid held between the member and the part of the substrate moves, as a whole, on the substrate by movement of the substrate. - View Dependent Claims (25, 26, 27, 28, 29)
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30. A device manufacturing method comprising:
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providing a liquid to a space between a projection system of a lithographic apparatus and a surface of a substrate, the liquid being provided via a liquid inlet provided on a surface of a member that extends parallel to and faces the surface of the substrate, and the liquid inlet facing the surface of the substrate; projecting a patterned radiation beam, using the projection system, through the liquid onto a target portion of the substrate; and determining a distance between the surface of the substrate and the member using a sensor. - View Dependent Claims (31, 32)
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Specification