Liquid crystal display device and fabricating method thereof
First Claim
1. A method of fabricating a liquid crystal display device, comprising:
- providing first and second substrates;
forming a gate pattern having a double layer structure including a first transparent conductive layer and a second opaque conductive layer on the first substrate using a first mask, the gate pattern including a pixel electrode, a gate electrode, and a gate line;
forming a first insulation film on the gate pattern;
forming a semiconductor pattern and a source/drain pattern on the first insulation film using a second mask, the source/drain pattern including a storage upper electrode, a drain electrode, a source electrode, and a data line, the gate and data lines defining a pixel region having a transmissive area and a reflective area;
forming a second insulation film covering the source/drain pattern;
forming a transmission hole passing through the second insulation film to the first insulation film using a third mask, the transmission hole is formed in the transmissive area;
forming a reflective electrode directly connecting the second conductive layer of the pixel electrode with the drain electrode and the storage upper electrode at an edge portion of the transmission hole, respectively and removing a portion of the second conductive layer of the pixel electrode using a fourth mask; and
forming a liquid crystal layer between the first and second substrates.
1 Assignment
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Accused Products
Abstract
A liquid crystal display device is provided that includes: first and second substrates; a gate line of a double layer having a first transparent conductive layer and a second opaque conductive layer on the first substrate; a first insulation film on the gate line; a data line crossing the gate line to define a pixel region, the pixel region having a transmissive area and a reflective area; a thin film transistor connected to the gate and data lines; a pixel electrode having the first conductive layer in the pixel region and a second conductive layer along the boundary of the first conductive layer; a storage upper electrode to form a storage capacitor by overlapping with the gate line the first insulation film there between; a transmission hole to expose the side of the storage upper electrode and a drain electrode of the thin film transistor by passing through the first insulation film and a second insulation film on the thin film transistor; a reflective electrode connected the second conductive layer of the pixel electrode with the drain electrode and the storage upper electrode through an edge portion of the transmission hole; and a liquid crystal layer between the first and second substrates.
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Citations
46 Claims
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1. A method of fabricating a liquid crystal display device, comprising:
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providing first and second substrates; forming a gate pattern having a double layer structure including a first transparent conductive layer and a second opaque conductive layer on the first substrate using a first mask, the gate pattern including a pixel electrode, a gate electrode, and a gate line; forming a first insulation film on the gate pattern; forming a semiconductor pattern and a source/drain pattern on the first insulation film using a second mask, the source/drain pattern including a storage upper electrode, a drain electrode, a source electrode, and a data line, the gate and data lines defining a pixel region having a transmissive area and a reflective area; forming a second insulation film covering the source/drain pattern; forming a transmission hole passing through the second insulation film to the first insulation film using a third mask, the transmission hole is formed in the transmissive area; forming a reflective electrode directly connecting the second conductive layer of the pixel electrode with the drain electrode and the storage upper electrode at an edge portion of the transmission hole, respectively and removing a portion of the second conductive layer of the pixel electrode using a fourth mask; and forming a liquid crystal layer between the first and second substrates. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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24. A method of fabricating a liquid crystal display device, comprising:
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providing first and second substrates; forming a gate pattern having a double layer of a first transparent conductive layer and a second opaque conductive layer on the first substrate using a first mask, the gate pattern including a storage electrode integrated with a storage line, a pixel electrode, a gate electrode and a gate line; forming a first insulation film on the gate pattern; forming a semiconductor pattern and a source/drain pattern on the first insulation film using a second mask, the source/drain pattern including a storage upper electrode integrated with a drain electrode, a source electrode, a data line, the data and gate lines defining a pixel region having a transmissive area and a reflective area; forming a second insulation film on the source/drain pattern; forming a transmission hole passing through the second insulation film to the first insulation film using a third mask, the transmission hole is formed in the transmissive area; forming a reflective electrode directly connecting the second conductive layer of the pixel electrode with the storage electrode at an edge portion of the transmission hole, respectively and removing the second conductive layer of the pixel electrode using a fourth mask; and forming a liquid crystal layer between the first and second substrates. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46)
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Specification