Exposure apparatus and method for producing device
First Claim
1. A liquid immersion exposure method for exposing a substrate by projecting an image of a pattern onto the substrate through a projection optical system and a liquid, comprising:
- determining a surface information about a surface of the substrate by receiving a detecting beam from the surface of the substrate without passing the detecting beam through the liquid so as to perform a measurement;
determining a relationship between the surface information about the surface of the substrate and an information of an image plane of the projection optical system formed through the liquid;
supplying the liquid onto the substrate; and
performing liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the liquid on the basis of the determined relationship between the surface information about the surface of the substrate and the information of the image plane of the projection optical system formed through the liquid without detecting the surface information about the surface of the substrate while the substrate is exposed.
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Accused Products
Abstract
An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.
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Citations
17 Claims
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1. A liquid immersion exposure method for exposing a substrate by projecting an image of a pattern onto the substrate through a projection optical system and a liquid, comprising:
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determining a surface information about a surface of the substrate by receiving a detecting beam from the surface of the substrate without passing the detecting beam through the liquid so as to perform a measurement; determining a relationship between the surface information about the surface of the substrate and an information of an image plane of the projection optical system formed through the liquid; supplying the liquid onto the substrate; and performing liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the liquid on the basis of the determined relationship between the surface information about the surface of the substrate and the information of the image plane of the projection optical system formed through the liquid without detecting the surface information about the surface of the substrate while the substrate is exposed. - View Dependent Claims (2, 6, 7, 8, 9, 10)
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3. A liquid immersion exposure method for exposing a substrate by projecting an image of a pattern onto the substrate through a projection optical system and a liquid, comprising:
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detecting an alignment mark on the substrate by receiving a detecting beam from the substrate without passing the detecting beam through the liquid; supplying the liquid onto the substrate; detecting a projection position of the image of the pattern formed through the liquid by the projection optical system; determining a positional relationship between the alignment mark detected not through the liquid and the image of the pattern formed through the liquid; and performing liquid immersion exposure for the substrate while performing alignment of the pattern and the substrate onto which the liquid has been supplied, on the basis of the determined positional relationship between the alignment mark and the image of the pattern. - View Dependent Claims (4, 5, 11, 12, 13, 14, 15, 16, 17)
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Specification