Low-maintenance coatings, and methods for producing low-maintenance coatings
First Claim
1. A substrate having a major surface on which there is a low-maintenance coating, the low-maintenance coating including a functional film comprising both titanium oxide and tungsten oxide, wherein the functional film has a tungsten load characterized by a metal-only weight ratio of between about 0.01 and about 0.34, this ratio being the weight of the tungsten in the film divided by the weight of the titanium in the film, wherein the substrate is glass in an annealed state, and wherein the functional film has a thickness of greater than 40 Å
- and less than 100 Å and
yet the low-maintenance coating has an acetone decomposition rate of greater than 1.4×
10−
10 moles/(liter)(second).
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Accused Products
Abstract
The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes both titanium oxide and tungsten oxide. The invention also provides methods and equipment for depositing such coatings.
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Citations
33 Claims
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1. A substrate having a major surface on which there is a low-maintenance coating, the low-maintenance coating including a functional film comprising both titanium oxide and tungsten oxide, wherein the functional film has a tungsten load characterized by a metal-only weight ratio of between about 0.01 and about 0.34, this ratio being the weight of the tungsten in the film divided by the weight of the titanium in the film, wherein the substrate is glass in an annealed state, and wherein the functional film has a thickness of greater than 40 Å
- and less than 100 Å and
yet the low-maintenance coating has an acetone decomposition rate of greater than 1.4×
10−
10 moles/(liter)(second). - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
- and less than 100 Å and
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13. A substrate having a major surface on which there is a low-maintenance coating, the low-maintenance coating including a functional film comprising both titanium oxide and tungsten oxide, wherein the functional film has a tungsten load characterized by a metal-only weight ratio of between about 0.01 and about 0.34, this ratio being the weight of the tungsten in the film divided by the weight of the titanium in the film, wherein the substrate is glass in a tempered state, and wherein the functional film has a thickness of greater than 40 Å
- and less than 100 Å and
yet the low-maintenance coating has an acetone decomposition rate of greater than 1.8×
10−
10 moles/(liter)(second). - View Dependent Claims (14, 15, 16, 25)
- and less than 100 Å and
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17. A substrate having a major surface on which there is a low-maintenance coating that includes a base film and a functional film, the functional film comprising both titanium oxide and tungsten oxide, wherein the functional film has a tungsten load characterized by a metal-only weight ratio of between about 0.01 and about 0.34, this ratio being the weight of the tungsten in the film divided by the weight of the titanium in the film, wherein the functional film has a thickness of greater than 40 Å
- and less than 100 Å
, the base film being a high-rate sputtered film deposited using at least one target in an atmosphere into which both inert gas and reactive gas are flowed, wherein an inflow rate for the inert gas divided by an inflow rate for the reactive gas is between 0.4 and 9, the functional film being a high-rate sputtered film deposited from at least one target having a sputterable material comprising both titanium oxide and tungsten oxide, wherein the substrate is glass in an annealed state, and wherein the low-maintenance coating has an acetone decomposition rate of greater than 1.4×
10−
10 moles/(liter)(second). - View Dependent Claims (18, 19, 20, 26, 27, 28, 29)
- and less than 100 Å
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21. A substrate having a major surface on which there is a low-maintenance coating, the low-maintenance coating having only a single photocatalytic layer, the photocatalytic layer comprising both titanium oxide and tungsten oxide throughout an entire thickness of the layer, wherein the photocatalytic layer has a tungsten load characterized by a metal-only weight ratio of between about 0.01 and about 0.34, this ratio being the weight of the tungsten in the layer divided by the weight of the titanium in the layer, wherein the substrate is glass in an annealed state, and wherein the photocatalytic layer has a thickness of greater than 40 Å
- and less than 100 Å and
yet the low-maintenance coating has an acetone decomposition rate of greater than 1.4×
10−
10 moles/(liter)(second). - View Dependent Claims (22, 30, 31, 32)
- and less than 100 Å and
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23. A substrate having a major surface on which there is a low-maintenance coating, the low-maintenance coating having only a single photocatalytic layer, the photocatalytic layer comprising both titanium oxide and tungsten oxide throughout an entire thickness of the layer, wherein the photocatalytic layer has a tungsten load characterized by a metal-only weight ratio of between about 0.01 and about 0.34, this ratio being the weight of the tungsten in the layer divided by the weight of the titanium in the layer, wherein the substrate is glass in a tempered state, and wherein the photocatalytic layer has a thickness of greater than 40 Å
- and less than 100 Å and
yet the low-maintenance coating has an acetone decomposition rate of greater than 1.8×
10−
10 moles/(liter)(second). - View Dependent Claims (24, 33)
- and less than 100 Å and
Specification