Semiconductor device and method for producing the same
First Claim
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1. A semiconductor device, comprising:
- a semiconductor element fixedly mounted on a substrate having a plurality of through holes provide on at least one edge of the substrate,wherein an electrode of the semiconductor element is to be electrically connected to a wiring pattern via each through hole,wherein each through hole has, on a surface of the substrate, an exposed through hole land of a width of 0.02 mm or more,wherein, for each through hole, a width X of the through hole land is given by;
X≦
(P−
A−
B)/2,where A is a through hole diameter, B is a distance between through hole lands, and P is a through hole pitch,wherein, for each through hole, the semiconductor element is coated with a resin that extends to an edge of the through hole land without covering the exposed through hole land and without covering the through hole, andwherein, for each through hole, the resin is shaped using a mold with a convex portion that presses the through hole at an area extending over the width of the exposed through hole land, so that no resin flows into the through hole during processing of the resin.
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Abstract
In a semiconductor device which has through holes in an end face, in which a semiconductor element is fixedly mounted on a face of a substrate which has a wiring pattern, which is conductive to the wiring portion formed in the through hole, in at least one face, in which electrodes of the semiconductor element are electrically connected to the wiring pattern, and in which the face of the substrate which has the semiconductor element is coated with a resin, the through hole has a through hole land with a width of 0.02 mm or more, which is conductive to the wiring portion, in a substrate face, and the wiring portion and the through hole land are exposed.
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3 Claims
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1. A semiconductor device, comprising:
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a semiconductor element fixedly mounted on a substrate having a plurality of through holes provide on at least one edge of the substrate, wherein an electrode of the semiconductor element is to be electrically connected to a wiring pattern via each through hole, wherein each through hole has, on a surface of the substrate, an exposed through hole land of a width of 0.02 mm or more, wherein, for each through hole, a width X of the through hole land is given by;
X≦
(P−
A−
B)/2,where A is a through hole diameter, B is a distance between through hole lands, and P is a through hole pitch, wherein, for each through hole, the semiconductor element is coated with a resin that extends to an edge of the through hole land without covering the exposed through hole land and without covering the through hole, and wherein, for each through hole, the resin is shaped using a mold with a convex portion that presses the through hole at an area extending over the width of the exposed through hole land, so that no resin flows into the through hole during processing of the resin. - View Dependent Claims (2, 3)
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Specification