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Semiconductor device and method of manufacturing semiconductor device

  • US 7,825,423 B2
  • Filed: 02/01/2007
  • Issued: 11/02/2010
  • Est. Priority Date: 02/02/2006
  • Status: Expired due to Fees
First Claim
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1. A semiconductor device comprising:

  • a silicon substrate;

    an optical functional device mounted on the silicon substrate;

    a cover having a light transparency and being disposed above the optical functional device;

    a light reflection preventing film made of stacked dielectrics, which prevents a reflection of a light, formed on an upper surface of the cover; and

    a phosphor film formed on a lower surface of the cover,wherein there is a space between an upper surface of the optical functional device and the phosphor film formed on the lower surface of the cover, andwherein there is no light reflection preventing film formed on the upper surface of the optical functional device.

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