Dual tone development with plural photo-acid generators in lithographic applications

• US 7,829,269 B1
• Filed: 09/22/2009
• Issued: 11/09/2010
• Est. Priority Date: 04/27/2009
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Scheer, Steven, Printz, Wallace P., Somervell, Mark, Fonseca, Carlos A.
• Primary Examiner(s): CHU, JOHN S Y
• Application Number:
  US12/564,755
• Publication Number:
  US 20100273111A1
• Time in Patent Office: 413 Days
• Field of Search: 430/311
• US Class Current: 430/394
• CPC Class Codes: G03F 7/095 having more than one photosensitive layer G03F7/075 takes precedence
• CPC Class Codes: G03F 7/30 Imagewise removal using liquid means
• CPC Class Codes: G03F 7/70466 Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature stitching G03F7/70475

Abstract

A method and system for patterning a substrate using a dual tone development process is described. The method comprises use of plural photo-acid generators with or without a flood exposure of the substrate to improve process latitude for the dual tone development process.

Claims

1. A method of patterning a substrate, comprising:

forming a layer of radiation-sensitive material on a substrate, said layer of radiation-sensitive material comprises a first photo-acid generator and a second photo-acid generator;

performing a patterned exposure of said layer of radiation-sensitive material to electromagnetic (EM) radiation; and

performing a flood exposure of said layer of radiation-sensitive material to electromagnetic (EM) radiation,

wherein said patterned exposure, or said flood exposure, or both said patterned exposure and said flood exposure contain a first wavelength or first range of wavelengths, and a second wavelength or second range of wavelengths,

wherein said first photo-acid generator generates acid in said layer of radiation-sensitive material when exposed to said EM radiation at said first wavelength or first range of wavelengths, and

wherein said second photo-acid generator generates acid in said layer of radiation-sensitive material when exposed to EM radiation at a second wavelength or second range of wavelengths.

2. The method of claim 1, wherein said first photo-acid generator is formulated to generate acid at a target wavelength and generate little to no acid beyond a pre-determined cut-off wavelength, and wherein said second photo-acid generator is formulated to generate acid at another target wavelength and generate little to no acid beyond another pre-determined cut-off wavelength.

3. The method of claim 1, wherein said patterned exposure is configured for exposing said layer of radiation-sensitive material to said first wavelength or first range of wavelengths, and said flood exposure is configured for exposing said layer of radiation-sensitive material to said second wavelength or second range of wavelengths.

4. The method of claim 1, wherein said patterned exposure is performed at 193 nanometers (nm), and said flood exposure is performed at 436 nm or 365 nm.

5. The method of claim 1, wherein said flood exposure is configured for exposing said layer of radiation-sensitive material to said first wavelength or first range of wavelengths, and said second wavelength or second range of wavelengths.

6. The method of claim 1, wherein said flood exposure comprises continuous EM radiation, pulsed EM radiation, poly-chromatic EM radiation, mono-chromatic EM radiation, broad-band EM radiation, or narrow-band radiation, or a combination thereof.

7. The method of claim 1, wherein said flood exposure comprises 436 nm (nanometer) EM radiation, 365 nm EM radiation, 248 nm EM radiation, 193 nm EM radiation, 157 nm EM radiation, or deep ultraviolet (DUV) EM radiation, or any combination of two or more thereof.

8. The method of claim 1, wherein said patterned exposure comprises 365 nm EM radiation, 248 nm EM radiation, 193 nm EM radiation, 157 nm EM radiation, or 13 nm EM radiation.

9. The method of claim 1, further comprising:

performing a first post-exposure bake following said performing said patterned exposure and preceding said performing said flood exposure.

10. The method of claim 9, further comprising:

performing a positive-tone developing of said layer of radiation-sensitive material following said first post-exposure bake and preceding said performing said flood exposure, said positive-tone developing facilitates removal of first radiation-sensitive material portions from said layer of radiation-sensitive material on said substrate.

11. The method of claim 10, further comprising:

performing a second post-exposure bake following said performing said flood exposure.

12. The method of claim 11, further comprising:

performing a negative-tone developing of said layer of radiation-sensitive material following said second post-exposure bake, said negative-tone developing facilitates removal of second radiation-sensitive material portions from said layer of radiation-sensitive material on said substrate.

13. The method of claim 12, wherein said performing said patterned exposure of said layer of radiation-sensitive material comprises exposing said layer of radiation-sensitive material to a pattern of radiation using a mask having a mask critical dimension to form said first radiation-sensitive material portions having a high radiation exposure, said second radiation-sensitive material portions having a low radiation exposure, and third radiation-sensitive material portions having an intermediate radiation exposure.