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Deposition of perovskite and other compound ceramic films for dielectric applications

  • US 7,838,133 B2
  • Filed: 09/02/2005
  • Issued: 11/23/2010
  • Est. Priority Date: 09/02/2005
  • Status: Expired due to Fees
First Claim
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1. A method of depositing a crystalline perovskite layer on a substrate, comprising:

  • placing the substrate into a reactor;

    flowing a gaseous mixture through the reactor;

    providing pulsed DC power to a conducting ceramic target in the reactor through a narrow band rejection filter such that a voltage on the conducting ceramic target alternates between positive and negative voltages, wherein the conducting ceramic target is formed of a perovskite material and is positioned opposite the substrate;

    providing, to the substrate, an RF bias power that corresponds to the narrow band rejection filter, wherein the crystalline perovskite layer is formed on the substrate without high temperature annealing.

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