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Photocatalyst materials having semiconductor characteristics and methods for manufacturing and using the same

  • US 7,846,864 B2
  • Filed: 02/16/2007
  • Issued: 12/07/2010
  • Est. Priority Date: 02/17/2006
  • Status: Expired due to Fees
First Claim
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1. A method for preparing a photocatalyst material comprising the sequential steps of:

  • (a) forming a mixture of a first-metal precursor and a second-metal precursor in a predetermined molar ratio of said second-metal relative to said first-metal, wherein said first-metal is a metal that exhibits photo-induced semiconductor properties and said second-metal is a dopant selected from the group consisting of tungsten (W), vanadium (V), and alloys and combinations thereof;

    (b) dialyzing the mixture of first-metal precursor and second-metal precursor to remove nonessential ion(s) from the mixture thereby to form a preliminary product comprising an oxide of the first-metal having ions of the second-metal dispersed therethrough;

    (c) drying the preliminary product to form a dried first-metal oxide product doped with ions of said second-metal, said dried product comprising very small particles; and

    ,(d) calcinating the dried first-metal oxide product by applying heat to form the photocatalyst material.

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