Optical measuring system

• US 7,847,227 B2
• Filed: 10/29/2007
• Issued: 12/07/2010
• Est. Priority Date: 12/12/2003
• Status: Expired due to Fees

• Current Assignee: Thomas Swan & Company Limited (Aixtron AG)
• Original Assignee: Thomas Swan & Company Limited (Aixtron AG)
• Inventors: Holmes, Melanie
• Primary Examiner(s): Epps; Georgia Y
• Assistant Examiner(s): Williams; Don
• Application Number:
  US11/978,471
• Publication Number:
  US 20080265150A1
• Time in Patent Office: 1,135 Days
• Field of Search: 2502011-2019, 250/216, 250/208.1, 250/221, 385/48, 359/10, 359/11, 359/35, 359/9, 359/15, 359/32, 348/40, 348/135
• US Class Current: 250/201.9
• CPC Class Codes: G01J 9/00 Measuring optical phase difference devices or arrangements for controlling the phase of light beams G02F1/01; Determining degree of coherence; Measuring optical wavelength spectrometry G01J3/00
• CPC Class Codes: G02B 26/06 for controlling the phase of light G02B26/08 takes precedence , measuring optical phase difference G01J9/00
• CPC Class Codes: G02B 27/46 Systems using spatial filters

Abstract

Apparatus and methods are described for measuring amplitude and phase variations in a spatially coherent beam of light. A beam of coherent light is made incident upon a spatial array of phase modulating elements displaying a pixellated first phase distribution. In a measuring region of said spatial array, the phase distribution is changed to a new value while retaining the first phase distribution outside the measuring region, for example by flashing a single pixel. The change in intensity resulting from the change in phase distribution is then determined.

Claims

1. Apparatus for characterising a spatially coherent beam of light, comprising:

a LCOS SLM arranged so that a said beam of light can be incident upon it;

means for causing the LCOS SLM to display a first hologram pattern;

means for causing the LCDS SLM to display a second hologram pattern at a location in said beam where the amplitude and phase of the beam are to be characterised;

means for changing the second hologram pattern displayed on the LCDOS SLM; and

means for measuring an intensity of light to determine the effect of said change of hologram pattern.

2. Apparatus as claimed in claim 1, wherein the means for measuring is disposed in the Fourier plane to detect the Fourier output.

3. Apparatus as claimed in claim 1, further comprising a lens for providing the Fourier output.

4. Apparatus as claimed in claim 1, further comprising a mirror for providing the Fourier output.

5. Apparatus according to claim 1 further comprising:

means for changing the first hologram pattern displayed on the SLM to a third hologram pattern, outside the location in said beam where the amplitude and phase are to be characterised; and

means for measuring an intensity of light to determine the effect of said change in hologram pattern.

6. A method for alignment of an optical system by use of a Spatial Light Modulator, SLM, the SLM having phase modulating elements, the method comprising:

a. rendering a beam incident on the SLM;

b. measuring the transverse phase and/or amplitude distribution of the beam on the SLM by varying a displayed phase distribution of the phase modulating elements; and

c. performing relative movement between the beam and the SLM to achieve a desired alignment of a feature of the beam with respect to the SLM.

7. The method of claim 6 wherein:

the optical system comprises a further optical component; and

the method further comprises;

d. adjusting the further optical component to move the position of a feature of the beam incident on the SLM towards a desired position on the SLM.

8. The method of claim 7 further comprising:

repeating the method steps a., b., c. and d. until the feature of the beam is incident on the SLM at the desired position.

9. The method of claim 7, wherein the step of adjusting the relative position between the SLM and the beam towards a desired position comprises adjusting the relative transverse position of the SLM with respect to the beam.

10. The method of claim 7, wherein the step of adjusting the relative position between the SLM and beam towards a desired position comprises adjusting the relative longitudinal position of the SLM relative to the beam.

11. The method of claim 10, wherein the beam has a symmetric phase distribution or a symmetric amplitude distribution.

12. The method of claim 11, wherein the beam is Gaussian.

13. The method of claim 12, wherein the beam is asymmetric.

14. The method of claim 6 further comprising:

d. adjusting the relative position between the SLM and the beam to move the position of a feature of the beam incident on the SLM towards a desired position on the SLM.

15. The method of claim 14 further comprising repeating the method steps a., b., c. and d. until the feature of the beam is incident on the SLM at the desired position.

16. The method of claim 6, further comprising assigning or re-assigning a block of pixels to the or each beam.

17. The method of claim 6, wherein the optical system further comprises a dispersive element such that different component wavelengths of the beam are incident on different portions of the SLM.

18. The method of claim 6, wherein the known feature of the beam is:

the centre of the beam, an edge of the beam, a phase feature, or an amplitude feature.

19. The method of claim 6, wherein the comparison comprises:

data fitting, centroiding, or feature extraction.

20. A method according to claim 6, further comprising:

d. rendering at least one further beam incident on the SLM;

e. measuring the phase and/or amplitude distribution of the or each further beam on the SLM by varying a displayed phase distribution of the phase modulating elements; and

f. performing said relative movement between the beam and the SLM to achieve a desired alignment of a feature of the beam and the or each further beam with respect to the SLM.

21. A method of measuring transverse amplitude and phase variations in a spatially coherent beam of light comprising:

a. causing the beam to be incident upon a spatial array displaying a pixellated first phase distribution, in a measuring region of said spatial array;

b. causing the phase distribution to change to a new value while retaining the first phase distribution outside the measuring region, in the Fourier plane;

c. determining the intensity resulting from the first change in phase distribution, outside the measuring region applying a second change in phase distribution, in the Fourier plane; and

d. determining the intensity resulting from the second change on phase distribution.