Magnesium silicide-based multilayer x-ray fluorescence analyzers
First Claim
1. A multilayer structure for reflecting x-rays comprising:
- a substrate having formed on a surface thereof at least one period of individual layers, wherein the at least one period includes at least three individual layers including a first layer, a second layer, and a third layer, wherein the first layer includes magnesium silicide (Mg2Si), the second layer includes at least one of silicon (Si), carbon (C), silicon carbide (SiC), boron (B), and boron carbide (B4C), and the third layer includes at least one of tungsten (W), tantalum (Ta), cobalt (Co), nickel (Ni), copper (Cu), iron (Fe), chromium (Cr), and alloys, oxides, borides, silicides, and nitrides of these elements.
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Accused Products
Abstract
The present invention provides a multilayer structure including a substrate having formed on a surface thereof at least one period of individual layers, the period having at least two layers including a first layer which includes magnesium silicide and a second layer which includes at least one of tungsten, tantalum, cobalt, nickel, copper, iron, chromium, alloys, oxides, borides, silicides, and nitrides of these elements, silicon, carbon, silicon carbide, boron, and boron carbide. If the period includes three layers, the second layer includes one of silicon, carbon, silicon carbide, boron, and boron carbide and a third layer includes one of tungsten, tantalum, cobalt, nickel, copper, iron, chromium, and alloys, oxides, borides, silicides, and nitrides of these elements, the second layer being disposed between the first and the third layers. If the period includes four layers, a fourth layer includes one of silicon, carbon, silicon carbide, boron, and boron carbide, the third layer being disposed between the second and fourth layers, and the fourth layer being disposed between the third layer of multilayer period n and the first layer of multilayer period n−1.
79 Citations
26 Claims
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1. A multilayer structure for reflecting x-rays comprising:
a substrate having formed on a surface thereof at least one period of individual layers, wherein the at least one period includes at least three individual layers including a first layer, a second layer, and a third layer, wherein the first layer includes magnesium silicide (Mg2Si), the second layer includes at least one of silicon (Si), carbon (C), silicon carbide (SiC), boron (B), and boron carbide (B4C), and the third layer includes at least one of tungsten (W), tantalum (Ta), cobalt (Co), nickel (Ni), copper (Cu), iron (Fe), chromium (Cr), and alloys, oxides, borides, silicides, and nitrides of these elements. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. An x-ray fluorescence spectroscopy system comprising:
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an x-ray source emitting an x-ray radiation field on a sample; and a multilayer structure including a substrate having formed on a surface thereof at least one period of individual layers, wherein the at least one period includes at least three individual layers including a first layer, a second layer, and a third layer, wherein the first layer includes magnesium silicide (Mg2Si), the second layer includes at least one of silicon (Si), carbon (C), silicon carbide (SiC), boron (B), and boron carbide (B4C), and the third layer includes at least one of tungsten (W), tantalum (Ta), cobalt (Co), nickel (Ni), copper (Cu), iron (Fe), chromium (Cr), and alloys, oxides, borides, silicides, and nitrides of these elements, wherein the sample emits a fluorescent radiation field in response to the x-ray radiation field, and wherein the multilayer structure selectively reflects the fluorescent radiation field. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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25. A method of x-ray fluorescence spectroscopy comprising:
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providing a field of x-ray radiation; irradiating a sample to be analyzed with the field of x-ray radiation, thereby inducing a field of fluorescence radiation; directing the field of fluorescence radiation from a multilayer reflector including a substrate having formed on a surface thereof at least one period of individual layers, wherein the at least one period includes at least three individual layers including a first layer, a second layer, and a third layer, wherein the first layer includes magnesium silicide (Mg2Si), the second layer includes at least one of silicon (Si), carbon (C), silicon carbide (SiC), boron (B), and boron carbide (B4C), and the third layer includes at least one of tungsten (W), tantalum (Ta), cobalt (Co), nickel (Ni), copper (Cu), iron (Fe), chromium (Cr), and alloys, oxides, borides, silicides, and nitrides of these elements; and analyzing the field of fluorescence radiation emitted by the sample. - View Dependent Claims (26)
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Specification