Method of forming complex oxide nanodots for a charge trap
First Claim
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1. A method comprising:
- forming spaced-apart nanodots over a substrate by exposing the substrate in a reaction space to pulses of a titanium source material, a strontium source material, an oxygen source material capable of forming an oxide with the titanium source material, and an oxygen source material capable of forming an oxide with the strontium source material to form a charge trap of a memory cell on the substrate,wherein the pulses are separated from one another in time.
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Abstract
Methods and devices are disclosed, such as those involving forming a charge trap for, e.g., a memory device, which can include flash memory cells. A substrate is exposed to temporally-separated pulses of a titanium source material, a strontium source material, and an oxygen source material capable of forming an oxide with the titanium source material and the strontium source material to form the charge trapping layer on the substrate.
104 Citations
26 Claims
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1. A method comprising:
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forming spaced-apart nanodots over a substrate by exposing the substrate in a reaction space to pulses of a titanium source material, a strontium source material, an oxygen source material capable of forming an oxide with the titanium source material, and an oxygen source material capable of forming an oxide with the strontium source material to form a charge trap of a memory cell on the substrate, wherein the pulses are separated from one another in time. - View Dependent Claims (4, 5, 15, 16, 17)
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2. A method comprising:
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exposing a substrate in a reaction space to temporally-separated pulses of a titanium source material, a strontium source material, an oxygen source material capable of forming an oxide with the titanium source material, and an oxygen source material capable of forming an oxide with the strontium source material to form a charge trap of a memory cell on the substrate, wherein each pulse of the titanium source material is followed by a pulse of the oxygen source material capable of forming an oxide with the titanium source material and wherein each pulse of the strontium source material is followed by a pulse of the oxygen source material capable of forming an oxide with the strontium source material.
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3. A method comprising:
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exposing a substrate in a reaction space to temporally-separated pulses of a titanium source material, a strontium source material, an oxygen source material capable of forming an oxide with the titanium source material, and an oxygen source material capable of forming an oxide with the strontium source material to form a charge trap of a memory cell on the substrate, and purging the reaction space with an inactive gas between the pulses of the titanium source material, the oxygen source material capable of forming an oxide with the titanium source material, the strontium source material, and the oxygen source material capable of forming an oxide with the strontium source material.
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6. A method comprising:
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exposing a substrate in a reaction space to temporally-separated pulses of a titanium source material, a strontium source material, an oxygen source material capable of forming an oxide with the titanium source material, and an oxygen source material capable of forming an oxide with the strontium source material to form a charge trap of a memory cell on the substrate, wherein the pulses are arranged in one or more titanium cycles and one or more strontium cycles, wherein each titanium cycle comprises a pulse of the titanium source material followed by a pulse of the oxygen source material, and each strontium cycle comprises a pulse of the strontium source material followed by a pulse of the oxygen source material. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14)
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18. A method comprising:
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alternately exposing a substrate to pulses of a first metal source material and a first oxygen source material, and alternately exposing the substrate to pulses of a second metal source material and a second oxygen source material to form spaced-apart nanodots over the substrate, the nanodots forming a charge trap for a memory device, wherein metals from the first and second metal source materials form a perovskite structure with oxygen from the first and second oxygen source materials. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26)
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Specification