Exposure apparatus, exposure method, and method for producing device
First Claim
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1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
- a projection optical system which includes a plurality of optical elements, at least one of the plurality of optical elements having a concave surface portion making contact with the liquid; and
a removing device which removes a foreign matter in a space inside of the concave surface portion, whereinthe removing device has a suction port which sucks the foreign matter, andthe removing device has a driving system which moves the suction port relative to the concave surface portion.
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Abstract
An exposure apparatus fills an optical path space of an exposure light beam with a liquid, and exposes a substrate by irradiating the substrate with the exposure light beam via a projection optical system and the liquid. A first optical element of the projection optical system is provided with a removing device for removing foreign matters in a space inside of the concave surface portion. Immersion exposure is performed by permitting the exposure light beam to excellently reach an image plane via the projection optical system and the liquid.
38 Citations
29 Claims
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1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which includes a plurality of optical elements, at least one of the plurality of optical elements having a concave surface portion making contact with the liquid; and a removing device which removes a foreign matter in a space inside of the concave surface portion, wherein the removing device has a suction port which sucks the foreign matter, and the removing device has a driving system which moves the suction port relative to the concave surface portion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. An exposure method which exposes a substrate by radiating an exposure light beam onto the substrate via a liquid and an optical element having a concave surface portion which makes contact with the liquid, the exposure method comprising:
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removing a foreign matter from the liquid in a space inside of the concave surface portion of the optical element with a removing device having a suction port which sucks the foreign matter, exposing the substrate by radiating the exposure light beam onto the substrate via the optical element and the liquid, and moving the suction port relative to the concave surface portion with a driving system. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29)
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Specification