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Exposure apparatus, exposure method, and method for producing device

  • US 7,852,456 B2
  • Filed: 10/12/2005
  • Issued: 12/14/2010
  • Est. Priority Date: 10/13/2004
  • Status: Expired due to Fees
First Claim
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1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

  • a projection optical system which includes a plurality of optical elements, at least one of the plurality of optical elements having a concave surface portion making contact with the liquid; and

    a removing device which removes a foreign matter in a space inside of the concave surface portion, whereinthe removing device has a suction port which sucks the foreign matter, andthe removing device has a driving system which moves the suction port relative to the concave surface portion.

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