Liquid crystal display device and fabricating method thereof using three mask process
First Claim
1. A method of fabricating a liquid crystal display device, comprising:
- a first mask process of forming a first mask pattern group including a gate line, a gate electrode connected to the gate line and a common line substantially parallel to the gate line having a first conductive layer group structure including at least double conductive layers which have a lowermost layer of transparent conductive layer and upper conductive layer of metal layer, and a common electrode extended from the lowermost layer of transparent conductive layer of the common line on a substrate;
a second mask process of forming a gate insulating film on the first mask pattern group and a semiconductor pattern on the gate insulating film; and
a third mask process of forming a third mask pattern group including a data line, a source electrode connected to the data line and a drain electrode opposite the source electrode having a second conductive layer group structure including at least double conductive layers which have a lowermost layer of transparent conductive layer and upper conductive layer of metal layer, and a pixel electrode extended from the lowermost layer of transparent conductive layer of the drain electrode, wherein the data line, the source electrode and the drain electrode are over the gate insulating film and the source electrode and the drain electrode are on both ends of the semiconductor pattern.
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Accused Products
Abstract
A LCD device includes a gate line on a substrate and a data line crossing the gate line to define a pixel area; a thin film transistor source and drain electrodes; a common line parallel to the gate line; a common electrode extended from the common line and a pixel electrode extending from the drain electrode wherein the gate line and the common line have a first conductive layer group having at least double conductive layers, and the common electrode is formed by an extension of at least one transparent conductive layer of the common line; and the gate line, the source electrode and the drain electrode have a second conductive layer group having at least double conductive layers, and the pixel electrode is formed by an extension of at least one transparent conductive layer of the drain electrode.
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Citations
19 Claims
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1. A method of fabricating a liquid crystal display device, comprising:
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a first mask process of forming a first mask pattern group including a gate line, a gate electrode connected to the gate line and a common line substantially parallel to the gate line having a first conductive layer group structure including at least double conductive layers which have a lowermost layer of transparent conductive layer and upper conductive layer of metal layer, and a common electrode extended from the lowermost layer of transparent conductive layer of the common line on a substrate; a second mask process of forming a gate insulating film on the first mask pattern group and a semiconductor pattern on the gate insulating film; and a third mask process of forming a third mask pattern group including a data line, a source electrode connected to the data line and a drain electrode opposite the source electrode having a second conductive layer group structure including at least double conductive layers which have a lowermost layer of transparent conductive layer and upper conductive layer of metal layer, and a pixel electrode extended from the lowermost layer of transparent conductive layer of the drain electrode, wherein the data line, the source electrode and the drain electrode are over the gate insulating film and the source electrode and the drain electrode are on both ends of the semiconductor pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification