Systems and methods for minimizing scattered light in multi-SLM maskless lithography

• US 7,859,735 B2
• Filed: 07/09/2009
• Issued: 12/28/2010
• Est. Priority Date: 01/06/2005
• Status: Expired due to Fees

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Hintersteiner, Jason D., Janik, Stan, Vladimirsky, Yuli, Cebuhar, Wenceslao A.
• Primary Examiner(s): MANNO, JESSICA S
• Application Number:
  US12/500,231
• Publication Number:
  US 20100002221A1
• Time in Patent Office: 537 Days
• Field of Search: 359/237, 359/738, 430/326
• US Class Current: 359/237
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70308 Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
• CPC Class Codes: G03F 7/70941 Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss

Abstract

A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.

Claims

1. A method, comprising:

generating beams using respective patterning devices, each of the respective patterning devices comprising a reflecting portion, the reflecting portion including an array of programmable elements that each are configured to produce a beam, and a non-reflecting portion, wherein respective beams form a patterned beam and wherein the non-reflecting portion is configured to produce stray beams;

directing the patterned beams onto a surface; and

blocking the stray beams from reaching the surface using an aperture device comprising a number of openings, the number corresponding to a number of the patterning devices, the openings arranged in a configuration to correspond to locations of the patterning devices, the openings being arranged in a configuration to transmit the patterned beam, while substantially blocking the stray beams;

wherein a spacing between adjacent ones of the elements in each of the array of programmable elements is smaller than a spacing between adjacent ones of the patterning devices.

2. The method of claim 1, wherein the non-reflecting portions scatter incident light.

3. The method of claim 1, wherein the surface is a surface of a display device, a wafer, or a camera.

4. The method of claim 1, wherein each of the pattern generating devices comprise a spatial light modulator.

5. The method of claim 4, wherein the spatial light modulator comprises a digital micromirror device, a transmissive liquid crystal light valve, or a grating light valve.

6. The method of claim 1, wherein the aperture is an aperture plate.

7. The method of claim 1, wherein:

the directing comprises directing the patterned beams towards the surface using a projection optics system; and

the aperture is etched onto a window near an object plane or image plane of the projection optics system.

8. The method of claim 1, wherein:

the directing comprises directing the patterned beams towards the surface using a projection optics system; and

the aperture is etched onto a lens within the projection optics system.