Semiconductor die separation method
First Claim
1. A method for preparing singulated semiconductor die, comprisingproviding a wafer having a front side in which semiconductor chip active regions are formed, the active regions being bounded by saw streets, the active regions having interconnect pads arranged in an interconnect margin along an interconnect edge thereof, the wafer having a thickness greater than a prescribed die thickness;
- performing a first wafer cutting procedure, wherein cuts are made along a first set of streets from the front side to a depth at least as great as the prescribed die thickness;
carrying out a die preparation procedure;
thinning the wafer to the prescribed die thickness; and
performing a second wafer cutting procedure along a second set of streets, passing completely through the wafer.
6 Assignments
0 Petitions
Accused Products
Abstract
According to the invention, die shift is reduced or substantially eliminated, by cutting the wafer in two stages. In some embodiments a first wafer cutting procedure is carried out prior to thinning the wafer to the prescribed die thickness; and in other embodiments the wafer is thinned to the prescribed die thickness prior to carrying out a first wafer cutting procedure. The first wafer cutting procedure includes cutting along a first set of streets to a depth greater than the prescribed die thickness and optionally along a second set of streets to a depth less than the die thickness. The result of the first cutting procedure is an array of strips or blocks of die, each including a plurality of connected die, that are less subject to shift than are individual singulated die. In a second wafer cutting procedure the die are singulated by cutting through along the second set of streets. Subsequent to the first cutting procedure, and prior to the second cutting procedure, additional die preparation procedures that are sensitive to die shift may be carried out.
-
Citations
24 Claims
-
1. A method for preparing singulated semiconductor die, comprising
providing a wafer having a front side in which semiconductor chip active regions are formed, the active regions being bounded by saw streets, the active regions having interconnect pads arranged in an interconnect margin along an interconnect edge thereof, the wafer having a thickness greater than a prescribed die thickness; -
performing a first wafer cutting procedure, wherein cuts are made along a first set of streets from the front side to a depth at least as great as the prescribed die thickness; carrying out a die preparation procedure; thinning the wafer to the prescribed die thickness; and performing a second wafer cutting procedure along a second set of streets, passing completely through the wafer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
-
-
14. A method for preparing singulated semiconductor die, comprising
providing a wafer having a front side in which semiconductor chip active regions are formed, the active regions being bounded by saw streets, the active regions having interconnect pads arranged in an interconnect margin along an interconnect edge thereof; -
thinning the wafer to a prescribed die thickness; performing a first wafer cutting procedure, wherein cuts are made along a first set of streets from the front side to a depth at least as great as the prescribed die thickness; carrying out a die preparation procedure; and performing a second wafer cutting procedure along a second set of streets, passing completely through the thinned wafer. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
-
Specification