Coaxial plasma arc vapor deposition apparatus and method

• US 7,867,366 B1
• Filed: 04/28/2004
• Issued: 01/11/2011
• Est. Priority Date: 04/28/2004
• Status: Expired due to Fees

• Current Assignee: Mahadevan Krishnan
• Original Assignee: Alameda Applied Sciences Corp.
• Inventors: Tang, Benjamin, Gerhan, Andrew N., Krishnan, Mahadevan, Wright, Jason D., McFarland, Michael D.
• Primary Examiner(s): Neckel; Alexa D
• Assistant Examiner(s): Band; Michael
• Application Number:
  US10/834,592
• Time in Patent Office: 2,449 Days
• Field of Search: 204/192.38, 204/290.01, 204/298.41, 427/561
• US Class Current: 204/192.38
• CPC Class Codes: C23C 14/046 Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
• CPC Class Codes: C23C 14/0635 Carbides
• CPC Class Codes: C23C 14/325 Electric arc evaporation
• CPC Class Codes: H01J 37/32055 Arc discharge
• CPC Class Codes: H01J 37/32614 Consumable cathodes for arc discharge

Abstract

An apparatus for the deposition of a variable thickness coating onto the inside of a cylindrical tube comprises a variable pressure gas, an cathode coaxially positioned within the cylinder, and a voltage source applied between the cathode and cylindrical tube, which functions as an anode. A radial plasma arc is generated between the anode and cathode at a starting point on the cylinder, and the plasma arc travels down the central axis of the cylinder, providing a helical deposition region on the inside of the cylinder. Selection of the combination of cathode material and gas enable the plasma to generate ionic material which is deposited on the anodic cylinder in the region of the plasma. By varying the pressure of variable pressure gas for each helical path, it is possible to vary the composition of this deposition film.

Claims

1. An apparatus for the deposition of an evaporated material from the outer surface of a cathode onto a cylindrical inner surface of an anode using a plasma, said apparatus comprising:

an enclosed chamber including a vacuum pump and a variable pressure gas source;

said cathode formed from a first conductive material and placed on an axis;

said cylindrical anode formed from a second conductive material, said cylindrical anode placed at a positive electrical potential with respect to said cathode, said cylindrical anode having at least one removable conductive cap attached to a plasma initiation end of said cylindrical anode or to both ends of said cylindrical anode, said cylindrical anode having a constant inner diameter over an extent of said cylindrical anode which includes said at least one removable conductive cap, said removable conductive cap fitting onto the constant inner diameter of said cylindrical anode and electrically connected to said cylindrical anode;

a magnetic field generator located external to said cylindrical anode, said magnetic field generator providing a temporally constant magnetic field oriented substantially parallel to said axis, said magnetic field being unidirectional over a radial extent from said cathode to said anode;

a voltage source delivering a positive voltage to said cylindrical anode and a negative voltage to said cathode, thereby creating and maintaining said plasma;

whereby said plasma has a plasma current which flows between said cathode and said anode and said magnetic field generator produces a magnetic field sufficient to cause said plasma to move helically down said axis at a speed controllable by the strength of said magnetic field such that said evaporated material is deposited on and contained by said inner surface of said anode;

and where at least one said removable conductive cap is located in a region of said anode where macro-particles of initiation or termination of said plasma may form.

2. The apparatus of claim 1 where said variable pressure gas source includes a valve which couples said gas source to said enclosed chamber following the evacuation of said chamber by said vacuum pump.

3. The apparatus of claim 2 where said variable pressure gas source is a variable pressure source of nitrogen.

4. The apparatus of claim 1 where said cathode includes at least one of the elements Chromium (Cr), Molybdenum (Mo), Niobium (Nb), Rhenium (Re), Tantalum (Ta), Titanium (Ti), or Tungsten (W).

5. The apparatus of claim 1 where said cathode includes a plasma initiator having an initiation surface coated with a conducting material.

6. The apparatus of claim 5 where said plasma initiator includes a trigger power supply delivering a pulsed voltage of sufficient amplitude to cause an area of arcing from said cathode.

7. The apparatus of claim 5 where said plasma initiator comprises a trigger power supply delivering a high voltage spark between said cathode and a cylindrical conductor separated from said cathode by an insulating material, said high voltage spark having an amplitude sufficient to cause arcing from said cathode to said stationary cylindrical conductor.

8. The apparatus of claim 5 where said plasma initiator includes a trigger power supply delivering a voltage between said cathode and a cylindrical conductor separated from said cathode by a conductive material located on said planar initiation surface between said cathode and said cylindrical conductor.

9. The apparatus of claim 7 where said surface resistive material has a resistance greater than 50 ohms.

10. The apparatus of claim 1 where said deposition is the reaction product from said gas and said cathode.

11. The apparatus of claim 10 where said reaction product is at least one of TaN, TaC, TiN, CrN, Al₂O₃, W₂C, Cr, Mo, Nb, Re, Ta, Ti, W.

12. The apparatus of claim 1 where said cathode is a solid rod.

13. The apparatus of claim 1 where said cathode is a hollow cylinder.

14. The apparatus of claim 13 where said hollow cylinder includes provision for a coolant.

15. The apparatus of claim 1 where said gas pressure is varied during a deposition cycle to provide a deposition thickness which varies along said axis extent.

16. A process for the deposition of an evaporated material from the outer surface of a cathode onto the inner surface of a cylindrical anode using a plasma, said process comprising the steps:

a first step of placing inside an enclosed chamber including a vacuum pump and a variable pressure gas source;

said cathode formed from a first conductive material and placed on an axis;

said cylindrical anode formed from a second conductive material, said cylindrical anode placed at a positive electrical potential with respect to said cathode, said cylindrical anode including at least one removable end cap for deposition of plasma macroparticles, said cylindrical anode having a constant inner diameter over an extent of said cylindrical anode which includes said removable end cap attached to one end of said cylindrical anode or to both ends of said cylindrical anode, said end caps fitting onto part of the constant inner diameter of said cylindrical anode and electrically connected to said cylindrical anode;

a magnetic field generator located external to said cylindrical anode, said magnetic field generator providing a temporally constant magnetic field oriented substantially parallel to said axis, said magnetic field being unidirectional over a radial extent from said cathode to said anode;

a voltage source delivering a voltage applied between said cylindrical anode and said cathode;

a second step of initiating a plasma arc from a first end of said cathode, said plasma arc forming a plasma having a plasma current, said plasma forming between said cathode outer surface and said cylindrical anode inner surface, said plasma interacting with said magnetic field to generate a substantially helical rotation of said plasma about said central axis and thereby depositing ions from said cathode onto the inner surface of said anode;

a third step of changing said gas pressure during a repetition of said second step;

a fourth step, after completion of said second step and said third step, of removing said at least one end cap having said macroparticles.

17. The process of claim 16 whereby said third step gas pressure is increased during said repetition of said second step from an initial value to a final value.

18. The process of claim 16 whereby said third step gas pressure is decreased during said repetition of said second step from an initial value to a final value.

19. The process of claim 16 where said first step gas source contains at least one of nitrogen, oxygen or methane.

20. The process of claim 16 where said cathode includes at least one of the elements Chromium (Cr), Molybdenum (Mo), Niobium (Nb), Rhenium (Re), Tantalum (Ta), Titanium (Ti), or Tungsten (W).

21. The process of claim 16 further including the use of chromium as said cathode, thereby producing said cylindrical anode suitable for use as a gun barrel.

22. The process of claim 16 further including the use of Aluminum as said cathode and oxygen as said gas, thereby producing said cylindrical anode suitable for use as an olefin pipe.