RF matching network of a vacuum processing chamber and corresponding configuration methods
First Claim
1. A RF matching network comprising:
- 1st to nth RF input ports connected respectively with a 1st to nth RF generator, and wherein each RF generator has a different frequency, and an output port that outputs energy of the respective RF generators to a vacuum processing chamber, and wherein the frequencies of the 1st to the nth RF input ports decline in sequence; and
whereinbetween the ith frequency RF input port, and the output port is an ith circuit, and wherein the ith circuit has a high impedance at the output port to all RF generator frequencies other than the ith frequency; and
whereinthe ith circuit, when connected to the RF generator with the ith frequency, and when measuring from the output port to the ith circuit, has a first impedance at the ith frequency; and
wherein when measuring from the output port, and in the opposite direction to the ith circuit, the ith circuit has a second impedance at the ith frequency; and
wherein the first impedance is a substantial conjugate match of the second impedance.
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Accused Products
Abstract
A RF matching network is described, and which includes a 1st to nth RF generators, and wherein each RF generator has a different frequency, and wherein the frequencies of the 1st to the nth RF input ports decline in sequence, and wherein between the ith frequency RF input port, and the output port is a ith circuit, which has a high impedance at the output port to all RF generator frequencies other than the ith frequency; and wherein the ith circuit, when connected to a RF generator with the ith frequency, and wherein measuring from the output port to the ith circuit, the ith circuit has a first impedance at the ith frequency; and when measuring from the output port in the opposite direction to the ith circuit, the ith circuit has a second impedance at the ith frequency; and wherein the first impedance is a substantial conjugate match of the second impedance.
60 Citations
27 Claims
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1. A RF matching network comprising:
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1st to nth RF input ports connected respectively with a 1st to nth RF generator, and wherein each RF generator has a different frequency, and an output port that outputs energy of the respective RF generators to a vacuum processing chamber, and wherein the frequencies of the 1st to the nth RF input ports decline in sequence; and
whereinbetween the ith frequency RF input port, and the output port is an ith circuit, and wherein the ith circuit has a high impedance at the output port to all RF generator frequencies other than the ith frequency; and
whereinthe ith circuit, when connected to the RF generator with the ith frequency, and when measuring from the output port to the ith circuit, has a first impedance at the ith frequency; and
wherein when measuring from the output port, and in the opposite direction to the ith circuit, the ith circuit has a second impedance at the ith frequency; and
wherein the first impedance is a substantial conjugate match of the second impedance. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A RF matching network comprising:
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a first frequency RF input port connected to a first frequency RF generator; a second frequency RF input port connected to a second frequency RF generator; and an output port that outputs the energy of one of both of the RF generators to a vacuum processing chamber, and wherein the first frequency is higher than the second frequency; and
wherein between the first frequency RF input port, and the output port is a first circuit which has a high impedance relative to the output port at the second frequency; and
wherein between the second frequency RF input port and the output port is a second circuit, which has high impedance relative to the output port at the first frequency, and wherein the first circuit, when connected to the first frequency RF generator, and when measuring from the output port to the first circuit, has a first impedance at the ith frequency, and further when measuring from the output port in the opposite direction to the first circuit, has a second impedance at the ith frequency, and wherein the first impedance is a substantial conjugate match of the second impedance. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17)
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18. A method for supplying RF energy to a vacuum processing chamber, comprising:
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connecting a first frequency RF input port to a first frequency RF generator; connecting a second frequency RF input port to a second frequency RF generator; providing an output port that outputs the energy produced by the respective RF generators to the vacuum processing chamber, and wherein the first frequency is higher than the second frequency; providing a first circuit which is located between the first frequency RF input and the output port, and wherein the first circuit has high impedance relative to the output port at the second frequency, and which is further connected to the first frequency RF generator; providing a second circuit between the second frequency RF input port, and the output port, and wherein the second circuit has a high impedance relative to the output port at the first frequency; measuring a first impedance at an ith frequency from the output port to the first circuit; and measuring a second impedance at the ith frequency from the output port in the opposite direction to the first circuit, and wherein the first impedance is substantially a conjugate match of the second impedance. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26)
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27. A RF matching network, comprising:
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a first and a second RF generator which each produce RF energy having a different frequency, and wherein each RF generator supplies the RF energy to a processing chamber; a first circuit coupling the first RF generator to the processing chamber, and which has a first high impedance relative to the frequency of RF energy provided by the second RF generator; and a second circuit coupling the second RF generator to the processing chamber, and which has a second high impedance relative to the frequency of RF energy provided by the first RF generator, and wherein the first impedance is a substantially conjugate match of the second impedance.
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Specification