Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution
First Claim
1. An antenna for use with a plasma source for an inductively-coupled plasma reactor, said antenna comprising:
- first, second and third inductive coils provided on a tube having a top flat surface and a side outer surface, each of said first, second and third inductive coils having a one-half turn upper section on the top flat surface coupled to a common input node on the top flat surface, a single turn or less lower section provided around the side outer surface of the tube and a connection section that connects the one-half turn upper section to the corresponding single turn or less lower section, and the first, second and third inductive coils are provided relative to each other to effect an even distribution of energy from a source received at the common input node,wherein the lower section of the first inductive coil, the lower section of the second inductive coil and the lower section of the third inductive coil all have a separate input node and all have a same radius and are provided in an up-down direction relative to each other such that the lower section of the second inductive coil is provided between the lower section of the first inductive coil and the lower section of the third inductive coil,wherein the input node of the lower section of the first inductive coil, the input node of the second inductive coil and the input node of the lower section of the third inductive coil are all provided on the side outer surface of the tube,wherein an output node of the first inductive coil, an output node of the second inductive coil and an output node of the third inductive coil are all provided on the side outer surface of the tube,wherein the input node of the second inductive coil is offset by 120 degrees relative to the input node of the first inductive coil, and the input node of the third inductive coil is offset by 120 degrees relative to the input node of the second inductive coil,wherein the output node of the second inductive coil is offset by 120 degrees relative to the output node of the first inductive coil, and the output node of the third inductive coil is offset by 120 degrees relative to the output node of the second inductive coil,wherein the connection section of the first inductive coil electrically connects the one-half turn upper section of the first inductive coil to the single turn or less lower section of the first inductive coil,wherein the connection section of the second inductive coil electrically connects the one-half turn upper section of the second inductive coil to the single turn or less lower section of the second inductive coil, andwherein the connection section of the third inductive coil electrically connects the one-half turn upper section of the third inductive coil to the single turn or less lower section of the third inductive coil.
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Accused Products
Abstract
An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals. Each element is feed by a feeder coil. While the antenna elements are disposed around a chamber, the feeder coils are disposed above the chamber to improved the distribution of electromagnetic energy within the chamber.
15 Citations
10 Claims
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1. An antenna for use with a plasma source for an inductively-coupled plasma reactor, said antenna comprising:
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first, second and third inductive coils provided on a tube having a top flat surface and a side outer surface, each of said first, second and third inductive coils having a one-half turn upper section on the top flat surface coupled to a common input node on the top flat surface, a single turn or less lower section provided around the side outer surface of the tube and a connection section that connects the one-half turn upper section to the corresponding single turn or less lower section, and the first, second and third inductive coils are provided relative to each other to effect an even distribution of energy from a source received at the common input node, wherein the lower section of the first inductive coil, the lower section of the second inductive coil and the lower section of the third inductive coil all have a separate input node and all have a same radius and are provided in an up-down direction relative to each other such that the lower section of the second inductive coil is provided between the lower section of the first inductive coil and the lower section of the third inductive coil, wherein the input node of the lower section of the first inductive coil, the input node of the second inductive coil and the input node of the lower section of the third inductive coil are all provided on the side outer surface of the tube, wherein an output node of the first inductive coil, an output node of the second inductive coil and an output node of the third inductive coil are all provided on the side outer surface of the tube, wherein the input node of the second inductive coil is offset by 120 degrees relative to the input node of the first inductive coil, and the input node of the third inductive coil is offset by 120 degrees relative to the input node of the second inductive coil, wherein the output node of the second inductive coil is offset by 120 degrees relative to the output node of the first inductive coil, and the output node of the third inductive coil is offset by 120 degrees relative to the output node of the second inductive coil, wherein the connection section of the first inductive coil electrically connects the one-half turn upper section of the first inductive coil to the single turn or less lower section of the first inductive coil, wherein the connection section of the second inductive coil electrically connects the one-half turn upper section of the second inductive coil to the single turn or less lower section of the second inductive coil, and wherein the connection section of the third inductive coil electrically connects the one-half turn upper section of the third inductive coil to the single turn or less lower section of the third inductive coil. - View Dependent Claims (2, 3, 4, 5)
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6. An antenna for use with a plasma source for an inductively-coupled plasma reactor, the antenna comprising:
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first, second and third inductive coils provided on a top flat surface and a side outer surface, each of said first, second and third inductive coils having a one-half turn upper section on the top flat surface coupled to a common input node on the top flat surface, each of the first, second and third inductive coils having a single turn or less lower section provided around the side outer surface and each of the first, second and third inductive coils having a connection section to electrically connect the one-half turn upper section to the corresponding single turn or less lower section, the first, second and third inductive coils to provide an even distribution of energy based on input of the energy to the common input node on the top flat surface, wherein the lower sections of the first, second and third inductive coils each have a separate input node and each have a same radius, and the lower section of the second inductive coil is provided between the lower section of the first inductive coil and the lower section of the third inductive coil, wherein the input node of the lower section of the first inductive coil, the input node of the lower section of the second inductive coil and the input node of the lower section of the third inductive coil are all provided on the side outer surface, wherein an output node of the first inductive coil, an output node of the second inductive coil and an output node of the third inductive coil are all provided on the side outer surface, wherein the input node of the second inductive coil is offset by 120 degrees relative to the input node of the first inductive coil, and the input node of the third inductive coil is offset by 120 degrees relative to the input node of the second inductive coil, wherein the output node of the second inductive coil is offset by 120 degrees relative to the output node of the first inductive coil, and the output node of the third inductive coil is offset by 120 degrees relative to the output node of the second inductive coil, wherein the connection section of the first inductive coil electrically connects the one-half turn upper section of the first inductive coil to the input node of the single turn or less lower section of the first inductive coil, wherein the connection section of the second inductive coil electrically connects the one-half turn upper section of the second inductive coil to the input node of the single turn or less lower section of the second inductive coil, and wherein the connection section of the third inductive coil electrically connects the one-half turn upper section of the third inductive coil to the input node of the single turn or less lower section of the third inductive coil. - View Dependent Claims (7, 8, 9, 10)
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Specification