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Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution

  • US 7,871,490 B2
  • Filed: 01/24/2006
  • Issued: 01/18/2011
  • Est. Priority Date: 03/18/2003
  • Status: Active Grant
First Claim
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1. An antenna for use with a plasma source for an inductively-coupled plasma reactor, said antenna comprising:

  • first, second and third inductive coils provided on a tube having a top flat surface and a side outer surface, each of said first, second and third inductive coils having a one-half turn upper section on the top flat surface coupled to a common input node on the top flat surface, a single turn or less lower section provided around the side outer surface of the tube and a connection section that connects the one-half turn upper section to the corresponding single turn or less lower section, and the first, second and third inductive coils are provided relative to each other to effect an even distribution of energy from a source received at the common input node,wherein the lower section of the first inductive coil, the lower section of the second inductive coil and the lower section of the third inductive coil all have a separate input node and all have a same radius and are provided in an up-down direction relative to each other such that the lower section of the second inductive coil is provided between the lower section of the first inductive coil and the lower section of the third inductive coil,wherein the input node of the lower section of the first inductive coil, the input node of the second inductive coil and the input node of the lower section of the third inductive coil are all provided on the side outer surface of the tube,wherein an output node of the first inductive coil, an output node of the second inductive coil and an output node of the third inductive coil are all provided on the side outer surface of the tube,wherein the input node of the second inductive coil is offset by 120 degrees relative to the input node of the first inductive coil, and the input node of the third inductive coil is offset by 120 degrees relative to the input node of the second inductive coil,wherein the output node of the second inductive coil is offset by 120 degrees relative to the output node of the first inductive coil, and the output node of the third inductive coil is offset by 120 degrees relative to the output node of the second inductive coil,wherein the connection section of the first inductive coil electrically connects the one-half turn upper section of the first inductive coil to the single turn or less lower section of the first inductive coil,wherein the connection section of the second inductive coil electrically connects the one-half turn upper section of the second inductive coil to the single turn or less lower section of the second inductive coil, andwherein the connection section of the third inductive coil electrically connects the one-half turn upper section of the third inductive coil to the single turn or less lower section of the third inductive coil.

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