System and method for controlling process end-point utilizing legacy end-point system
First Claim
1. A method comprising:
- providing a first end-point determination (EPD) system of a processing tool;
monitoring a process in the processing tool using a second EPD system; and
creating an artificial end-point condition using the second EPD system that causes the first EPD system to determine that an end-point of the process run on the processing tool has been reached, whereby the first EPD system sends an end-point command to the processing tool.
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Accused Products
Abstract
Embodiments in accordance with the present invention allow a second end-point determination (EPD) system to actively control the end-pointing of a semiconductor process chamber, by leveraging a legacy EPD system that is already integrated with the chamber. In one embodiment, the second EPD system controls a shutter that regulates the amount of light transmitted between a plasma light source and an optical emission spectroscopy (OES) sensor of the legacy OES EPD system. In this embodiment, the legacy OES EPD system is pre-configured to call end-point when an artificial end-point condition occurs, i.e. the intensity of light falls below a pre-set threshold. When the second EPD system determines an actual end-point condition has been reached, it closes the shutter which, causes the light intensity being read by the OES sensor to fall below the pre-set threshold. This in turn triggers an end-point command to the chamber from the legacy OES EPD system.
13 Citations
19 Claims
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1. A method comprising:
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providing a first end-point determination (EPD) system of a processing tool; monitoring a process in the processing tool using a second EPD system; and creating an artificial end-point condition using the second EPD system that causes the first EPD system to determine that an end-point of the process run on the processing tool has been reached, whereby the first EPD system sends an end-point command to the processing tool. - View Dependent Claims (2, 3, 4, 9)
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- 5. A method according to claim l wherein the first EPD system determines the end-point based upon measurements from an optical emissions spectroscopy (OES) sensor.
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10. An apparatus comprising:
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an input port configured to receive a signal; and circuitry in communication with the input port and configured to receive the signal, and in response to output a second signal corresponding to an artificial condition that results in a first end-point determination (EPD)device determining that a process end-point has been reached, whereby the first EPD device sends an end-point command to a processing tool. - View Dependent Claims (11, 12, 13, 14)
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15. A system comprising:
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a first end-point determination (EPD) system; a second EPD system in communication with a chamber of a processing tool; an apparatus configured to receive a first signal from the second EPD system indicating that a process occurring in the chamber has reached an actual end-point condition, and in response to create an artificial end-point condition which the first EPD system recognizes as an end-point of the process, whereby the first EPD system sends an end-point command to the processing tool. - View Dependent Claims (16, 17, 18, 19)
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Specification