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System and method for lithography simulation

  • US 7,873,937 B2
  • Filed: 09/26/2006
  • Issued: 01/18/2011
  • Est. Priority Date: 10/07/2003
  • Status: Active Grant
First Claim
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1. A system to simulate a lithographic design comprised of a plurality of polygons arranged in a predetermined configuration, the system comprising:

  • a microprocessor subsystem to convert a circuit design database, which is representative of a integrated circuit pattern, to a pixel-based bitmap representation thereof, wherein the pixel-based bitmap includes pixel data; and

    an accelerator subsystem, coupled to the microprocessor subsystem, to calculate at least a portion of an aerial image of the lithographic design using the pixel-based bitmap representation of the lithographic design.

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