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Process for producing silicon oxide films for organoaminosilane precursors

  • US 7,875,312 B2
  • Filed: 05/23/2006
  • Issued: 01/25/2011
  • Est. Priority Date: 05/23/2006
  • Status: Active Grant
First Claim
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1. A process for forming a silicon oxide film on a substrate which comprises:

  • forming the silicon oxide film on the substrate in a chemical vapor deposition process by reaction with an oxidizing agent with a silane precursor selected from the group consisting of an organoaminosilane represented by the formulas;

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