Method for a multiple exposure, microlithography projection exposure installation and a projection system
First Claim
1. An exposure method for exposing a substrate, the exposure method comprising:
- providing a microlithography projection exposure installation comprising a first projection system and a second projection system disposed away from the first projection system in a first direction;
radiating a first light beam onto a first exposure area using the first projection system;
radiating a second light beam onto a second exposure area using the second projection system, the first and second exposure areas being defined at different positions in the first direction; and
moving the substrate in the first direction to thereby expose a predetermined area on the substrate with a first pattern image which is formed by the first light beam and a second pattern image which is formed by the second light beam.
2 Assignments
0 Petitions
Accused Products
Abstract
In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first projection system, and a second exposure is carried out in accordance with a second set of exposure parameters on a second projection system spatially separated from the first projection system. The projection systems are integrated in a common projection exposure installation. The first exposure can be carried out, for example, with an amplitude mask, the second exposure with a phase mask. The use of a number of projection systems enables multiple exposure that is performed in parallel and is therefore timesaving.
-
Citations
9 Claims
-
1. An exposure method for exposing a substrate, the exposure method comprising:
-
providing a microlithography projection exposure installation comprising a first projection system and a second projection system disposed away from the first projection system in a first direction; radiating a first light beam onto a first exposure area using the first projection system; radiating a second light beam onto a second exposure area using the second projection system, the first and second exposure areas being defined at different positions in the first direction; and moving the substrate in the first direction to thereby expose a predetermined area on the substrate with a first pattern image which is formed by the first light beam and a second pattern image which is formed by the second light beam. - View Dependent Claims (2, 3, 4, 5)
-
-
6. A method, comprising:
-
while a substrate is in a first position, radiating an area of the substrate with a first light beam using a first projection system of a microlithography projection exposure installation; moving the substrate from the first position to a second position different from the first position; while the substrate is in the second position, radiating the area of the substrate with a second light beam using a second projection system of the microlithography projection exposure installation, the second projection system being different from the first projection system. - View Dependent Claims (7, 8, 9)
-
Specification